Fabrication method for arranging ultra-fine particles
View Patent ↗A method and resultant device, in which metal nanoparticles are self-assembled into two-dimensional lattices. A periodic hole pattern (wells) is fabricated on a photoresist substrate, the wells having an aspect ratio of less than 0.37. The nanoparticles are synthesized within inverse micelles of a polymer, preferably a block copolymer, and are self-assembled onto the photoresist nanopatterns. The nanoparticles are selectively positioned in the holes due to the capillary forces related to the pattern geometry, with a controllable number of particles per lattice point.
1. A fabricated device comprising:
a photoresist coated-substrate formed with wells through its surface, said wells having gradually sloping walls and an aspect ratio of less than 0.37, and micelles enclosing nanoparticles disposed in said wells.
2. The fabricated device of claim 1 in which said wells have an aspect ratio less than or equal to 0.3.
3. The fabricated device of claim 1 wherein the nanoparticles are metal nanoparticles.
4. The fabricated device of claim 3 wherein the metal is cobalt.
5. The fabricated device of claim 1 wherein said nanoparticles have a diameter of 0.5 to 500 nm and said wells are less than 1 μm in diameter.
6. The fabricated device of claim 1 wherein the diameter of said micelles in dry condition is 0.01 to 1.0 times the diameter of said wells.
7. The fabricated device of claim 1 wherein the diameter of said micelles in solution is less than 1.5 times the diameter of said wells.
8. The fabricated device of claim 1 wherein said wells are arranged in an ordered manner.
9. The fabricated device of claim 1 wherein said wells are arranged in a random manner.
10. The fabricated device of claim 1 , wherein said wells have a bottom surface comprising of said photoresist.
11. The fabricated device of claim 1 , wherein said wells have a bottom surface where the photoresist has been removed.
12. A fabricated device comprising:
a GaAs substrate coated with a photoresist layer of a photo sensitive chemical resistant to acid, said substrate and photoresist layer defining wells that have gradually sloping walls and an aspect ratio of less than 0.37, and micelles within said wells, said micelles incorporating cobalt nanoparticles in the device.
13. The fabricated device of claim 12 wherein said wells are in the form of periodic elongate grooves.
14. The fabricated device of claim 12 wherein said wells are 100-200 nm deep.