Method of descaling a mask

1. A method of descaling a deposition mask, the method comprising:

providing a deposition mask, the deposition mask comprising:

a pattern comprising an opening, wherein the opening is configured to pass a material there though to be deposited onto a substrate; and

a thin film of the material attached to the deposition mask;

directing a laser beam with a pulse frequency of about 60 Hz and a pulse strength of about 600 mJ to about 900 mJ onto the material attached to the deposition mask to weaken the bonds between the material and the mask;

removing the material attached to the mask, comprising:

immersing the deposition mask in deionized water, wherein immersing comprises directing an ultrasonic wave into the deionized water while the deposition mask is immersed in the deionized water;

immersing the deposition mask in a liquid organic solvent; and

drying the deposition mask using an air knife.

2. The method of claim 1 , wherein the directing of the ultrasonic wave into the deionized water while the deposition mask is immersed in the deionized water forms a focus on the surface of the deionized water.

3. The method of claim 1 , wherein the immersing of the deposition mask in the deionized water comprises directing an ultrasonic wave into the deionized water at least twice while the deposition mask is immersed in the deionized water.

4. The method of claim 1 , wherein the removing of the material attached to the deposition mask comprises immersing the deposition mask in the organic solvent for at least about one minute.

5. The method of claim 1 , wherein the pattern comprises a slit.

6. The method of claim 1 , wherein the thin film of the material comprises an organic material.

7. The method of claim 1 , wherein the thin film of the material comprises a metal material.

8. The method of claim 1 , wherein directing the laser beam comprises directing a laser beam produced by an Nd:YAG laser.

9. The method of claim 1 , wherein directing the laser beam comprises applying a plurality of consecutive laser pulses wherein about half of pulse widths of two consecutive laser pulses overlap each other.

10. The method of claim 1 , further comprising generating a plasma using the directed laser beam.

11. The method of claim 1 , wherein immersing the deposition mask in the liquid organic solvent comprises immersing the deposition mask in a liquid organic solvent comprising one of acetone and pyrrolidinone.

12. The method of claim 1 , wherein immersing the deposition mask in the liquid organic solvent comprises immersing the deposition mask in the liquid organic solvent for a time duration not exceeding about 5 minutes.