Solar cell with antireflective coating with graded layer including mixture of titanium oxide and silicon oxide
View Patent ↗There is provided a coated article (e.g., solar cell) that includes an improved anti-reflection (AR) coating. This AR coating functions to reduce reflection of light from a glass substrate, thereby allowing more light within the solar spectrum to pass through the incident glass substrate. In certain example embodiments, the AR coating includes a graded base layer having a varying refractive index value, and an overcoat layer which may be provided for destructive interference purposes.
1. A photovoltaic device comprising:
a photovoltaic layer and at least a glass substrate on a light incident side of the photovoltaic layer;
an anti-reflection coating provided on the glass substrate, the anti-reflection coating being located on a light-incident side of the glass substrate;
wherein the anti-reflection coating consists essentially of a graded layer provided directly on and contacting the glass substrate and a layer comprising silicon oxide over and contacting the graded layer, the graded layer including a mixture of silicon oxide, and titanium oxide supplemented with zirconium oxide, with more titanium oxide and zirconium oxide being provided in a far portion of the graded layer farther from the glass substrate than in a near portion of the graded layer closer to the glass substrate, and wherein the graded layer has a thickness of at least one wavelength; and
wherein the layer comprising silicon oxide has about a quarter-wavelength thickness and is located on and directly contacting the graded layer.
2. The photovoltaic device of claim 1 , wherein the near portion of the graded layer has a refractive index value less than that of the far portion of the graded layer.
3. The photovoltaic device of claim 1 , where the near portion of the graded layer is made up of predominately silicon oxide.
4. The photovoltaic device of claim 1 , wherein the near portion of the graded layer has a refractive index value of from about 1.46 to 1.9.
5. The photovoltaic device of claim 1 , wherein the near portion of the graded layer has a refractive index value of from about 1.46 to 1.7, wherein the titanium oxide is TiO 2 and the silicon oxide is SiO 2 .
6. The photovoltaic device of claim 1 , wherein the far portion of the graded layer has a refractive index value of from about 2.0 to 2.55.
7. The photovoltaic device of claim 1 , wherein the far portion of the graded layer has a refractive index value of from about 2.3 to 2.55.
8. The photovoltaic device of claim 1 , wherein the far portion of the graded layer is made up predominately of titanium oxide and zirconium oxide.
9. The photovoltaic device of claim 1 , wherein the layer comprising silicon oxide, which is located on and contacting the graded layer, has a physical thickness of from about 80 to 140 nm thick.
10. The photovoltaic device of claim 1 , wherein the near portion of the graded layer is made up of from about 40-100% silicon oxide and the far portion of the graded layer is made up of from about 50-100% titanium oxide and zirconium oxide.
11. The photovoltaic device of claim 1 , wherein the near portion of the graded layer is made up of from about 70-100% silicon oxide and the far portion of the graded layer is made up of from about 70-100% titanium oxide and zirconium oxide.
12. The photovoltaic device of claim 1 , wherein the glass substrate comprises:
Ingredient
wt. %
SiO 2
67-75%
Na 2 O
10-20%
CaO
5-15%
total iron (expressed as Fe 2 O 3 )
0.001 to 0.06%
cerium oxide
0 to 0.30%
wherein the glass substrate by itself has a visible transmission of at least 90%, a transmissive a* color value of−1.0 to +1.0 and a transmissive b* color value of from 0 to +1.5.