Nitride-based light emitting heterostructure
An improved nitride-based light emitting heterostructure is provided. The nitride-based light emitting heterostructure includes an electron supply layer and a hole supply layer with a light generating structure disposed there between. The light generating structure includes a set of barrier layers, each of which has a graded composition and a set of quantum wells, each of which adjoins at least one barrier layer. Additional features, such as a thickness of each quantum well, can be selected/incorporated into the heterostructure to improve one or more of its characteristics. Further, one or more additional layers that include a graded composition can be included in the heterostructure outside of the light generating structure. The graded composition layer(s) cause electrons to lose energy prior to entering a quantum well in the light generating structure, which enables the electrons to recombine with holes more efficiently in the quantum well.
1. A nitride-based light emitting heterostructure comprising:
an electron supply layer;
a hole supply layer; and
a light generating structure disposed between the electron supply layer and the hole supply layer, the light generating structure including:
a set of barrier layers, each barrier layer comprising a graded composition; and
a set of quantum wells, each quantum well adjoined by a barrier layer and having a thickness less than a characteristic radius of a defect responsible for nonradiative recombination, wherein the graded composition of each barrier layer causes electrons to lose energy prior to entering a quantum well.
2. The nitride-based light emitting heterostructure of claim 1 , wherein a thickness of each quantum well is such that an electron ground state of each quantum well is above a band bending range of energies caused by a set of polarization effects.
3. The nitride-based light emitting heterostructure of claim 1 , each barrier layer comprising one of an AlGaN or an AlGaInN composition.
4. The nitride-based light emitting heterostructure of claim 1 , further comprising an electron blocking layer disposed between the light generating structure and the hole supply layer.
5. The nitride-based light emitting heterostructure of claim 4 , wherein the electron blocking layer comprises a graded composition that transitions from a hole supply layer composition to an electron blocking layer composition.
6. The nitride-based light emitting heterostructure of claim 1 , wherein the hole supply layer comprises a graded composition that transitions from a hole supply layer composition to an electron blocking layer composition closer to the light generating structure.
7. The nitride-based light emitting heterostructure of claim 1 , further comprising:
a substrate;
a buffer layer on the substrate; and
a strain-relieving structure over the buffer layer.
8. The nitride-based light emitting heterostructure of claim 1 , wherein the electron supply layer comprises an n-type contact layer and wherein the hole supply layer comprises a p-type contact layer.
9. The nitride-based light emitting heterostructure of claim 1 , further comprising at least one barrier layer adjacent to the electron supply layer, the at least one barrier layer comprising a graded composition that creates a band structure profile such that electrons entering the light generating structure have an energy that is approximately the same as an energy of a polar optical phonon.
10. The nitride-based light emitting heterostructure of claim 1 , further comprising at least one barrier layer adjacent to the hole supply layer, the at least one barrier layer comprising a graded composition that creates a band structure profile such that holes entering the light generating structure have an energy that is approximately the same as an energy of a polar optical phonon.
11. The nitride-based light emitting heterostructure of claim 1 , wherein the hole supply layer comprises a doped short period superlattice.
12. The nitride-based light emitting heterostructure of claim 1 , further comprising a p-type layer disposed between the light generating structure and the hole supply layer.
13. The nitride-based light emitting heterostructure of claim 1 , further comprising a Distributive Bragg Reflector (DBR) structure disposed over the light generating structure.
14. The nitride-based light emitting heterostructure of claim 13 , wherein the DBR structure comprises a doped p-type composition.
15. The nitride-based light emitting heterostructure of claim 1 , further comprising an anodized aluminum layer disposed over the hole supply layer.
16. The nitride-based light emitting heterostructure of claim 15 , wherein the hole supply layer and the anodized aluminum layer comprise a plurality of holes that form a photonic crystal.
17. The nitride-based light emitting heterostructure of claim 15 , wherein the hole supply layer includes a set of holes, each of which is aligned with a hole in the anodized aluminum layer.
18. The nitride-based light emitting heterostructure of claim 17 , wherein at least one of the set of holes includes a material having a different refractive index than a composition of the p-type layer.
19. A nitride-based light emitting device comprising:
a substrate;
a buffer layer on the substrate;
a strain-relieving structure over the buffer layer;
an electron supply layer over the strain-relieving structure;
a hole supply layer; and
a light generating structure disposed between the electron supply layer and the hole supply layer, the light generating structure including:
a set of barrier layers, each barrier layer comprising a graded composition; and
a set of quantum wells, each quantum well adjoined by a barrier layer and having a thickness less than a characteristic radius of at least one defect responsible for nonradiative recombination.
20. The nitride-based light emitting device of claim 19 , configured to operate as one of a light emitting diode or a laser.
21. The nitride-based light emitting heterostructure of claim 1 , wherein each barrier layer has a varying composition of Aluminum that increases a baffler for electrons and reduces a barrier for holes at a boundary with a quantum well as compared to a baffler layer having a constant composition of Aluminum.