IP Library Granted Patent US 7,544,244
Granted Patent B2
US 7,544,244 · App. 11/294,541 · Granted Jun 9, 2009

Method of manufacturing ceramic film and structure including ceramic film

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Quick Facts
Patent No.
US 7,544,244
App. No.
11/294,541
Granted
Jun 9, 2009
Kind
B2
Abstract

A method of manufacturing a ceramic film by using an AD method, by which a film having good crystallinity can be fabricated without using a high-temperature process. The method of manufacturing a ceramic film by using an aerosol including the steps of: (a) dispersing ceramic raw material powder containing an amorphous component in a gas to generate an aerosol; and (b) supplying the aerosol generated at step (a) into a chamber in which a substrate is placed and depositing the ceramic raw material powder on the substrate to form a ceramic film.

Claims (42)

1. A method of manufacturing a ceramic film by using an aerosol, said method comprising the steps of:

(a) dispersing ceramic raw material powder containing an amorphous component in a gas to generate an aerosol; and

(b) supplying the aerosol generated at step (a) into a chamber in which a substrate is placed and depositing said ceramic raw material powder on said substrate to form a ceramic film,

wherein step (b) includes forming the ceramic film while keeping said substrate at a predetermined temperature and crystallizing the amorphous component contained in the ceramic raw material powder on said substrate.

2. A method of manufacturing a ceramic film by using an aerosol, said method comprising the steps of:

(a) dispersing ceramic raw material powder containing a component, which produces exothermic reaction by being provided with energy from outside, in a gas to generate an aerosol; and

(b) supplying the aerosol generated at step (a) into a chamber in which a substrate is placed and depositing said ceramic raw material powder on said substrate to form a ceramic film,

wherein step (b) includes forming the ceramic film while keeping said substrate at a predetermined temperature and crystallizing the ceramic raw material powder on said substrate.

3. A method according to claim 2 , wherein said ceramic raw material powder includes gel powder.

4. A method according to claim 1 , wherein step (b) includes depositing said ceramic raw material powder on said substrate by injecting the aerosol generated at step (a) from a nozzle toward said substrate.

5. A method according to claim 2 , wherein step (b) includes depositing said ceramic raw material powder on said substrate by injecting the aerosol generated at step (a) from a nozzle toward said substrate.

6. A method of manufacturing a ceramic film by using an aerosol, said method comprising the steps of:

(a) dispersing ceramic raw material powder containing an amorphous component in a gas to generate an aerosol;

(b) supplying the aerosol generated at step (a) into a chamber in which a substrate is placed and depositing said ceramic raw material powder on said substrate to form a ceramic film; and

(c) heating the ceramic film formed on said substrate at step (b) to crystallize the amorphous component contained in the ceramic film.

7. A method of manufacturing a ceramic film by using an aerosol, said method comprising the steps of:

(a) dispersing ceramic raw material powder containing a component, which produces exothermic reaction by being provided with energy from outside, in a gas to generate an aerosol;

(b) supplying the aerosol generated at step (a) into a chamber in which a substrate is placed and depositing said ceramic raw material powder on said substrate to form a ceramic film; and

(c) heating the ceramic film formed on said substrate at step (b) to grow crystal grain in the ceramic film.

8. A method of manufacturing a ceramic film by using an aerosol, said method comprising the steps of:

(a) dispersing ceramic raw material powder containing an amorphous component in a gas to generate an aerosol;

(b) supplying the aerosol generated at step (a) into a chamber in which a substrate is placed and depositing said ceramic raw material powder on said substrate to form a ceramic film; and

(c) applying electromagnetic waves to the ceramic film formed on said substrate at step (b) to crystallize the amorphous component contained in the ceramic film.

9. A method of manufacturing a ceramic film by using an aerosol, said method comprising the steps of:

(a) dispersing ceramic raw material powder containing a component, which produces exothermic reaction by being provided with energy from outside, in a gas to generate an aerosol;

(b) supplying the aerosol generated at step (a) into a chamber in which a substrate is placed and depositing said ceramic raw material powder on said substrate to form a ceramic film; and

(c) applying electromagnetic waves to the ceramic film formed on said substrate at step (b) to grow crystal grain in the ceramic film.

10. A method of manufacturing a ceramic film by using an aerosol, said method comprising the steps of:

(a) dispersing ceramic raw material powder containing an amorphous component in a gas to generate an aerosol;

(b) supplying the aerosol generated at step (a) into a chamber in which a substrate is placed and depositing said ceramic raw material powder on said substrate to form a ceramic film; and

(c) applying plasma to the ceramic film formed on said substrate at step (b) to crystallize the amorphous component contained in the ceramic film.

11. A method of manufacturing a ceramic film by using an aerosol, said method comprising the steps of:

(a) dispersing ceramic raw material powder containing a component, which produces exothermic reaction by being provided with energy from outside, in a gas to generate an aerosol;

(b) supplying the aerosol generated at step (a) into a chamber in which a substrate is placed and depositing said ceramic raw material powder on said substrate to form a ceramic film; and

(c) applying plasma to the ceramic film formed on said substrate at step (b) to grow crystal grain in the ceramic film.

12. A method according to claim 1 , wherein said ceramic raw material powder includes a piezoelectric material.

13. A method according to claim 2 , wherein said ceramic raw material powder includes a piezoelectric material.

14. A method according to claim 1 , wherein said ceramic raw material powder includes at least one of Pb(Zr,Ti)O 3 , Pb(Mg 1/3 Nb 2/3 )O 3 , Pb(Zn 1/3 Nb 2/3 )O 3 , Pb(Ni 1/3 Nb 2/3 )O 3 , (Pb,La)(Zr,Ti)O 3 , MgO, SiC, Si 3 N 4 , Al 2 O 3 , TiC, B 4 C, BN, Fe 2 O 3 , Mn,Zn) Fe 2 O 4 , Ta 2 O 5 , Nb 2 O 5 , PbTiO 3 , (Ca,Ba,Sr)TiO 3 , (Li,K)(Nb,Ta)O 3 , SrBi 2 (Ta,Nb) 2 O 9 , Bi 4 Ti 3 O 12 , ZrO 2 , SnO 2 , ZnO, La(Cr,Mn)O 3 , TiO 2 , IrO 2 , LaNiO 3 , (Ca,Sr,Ba)RuO 3 , In—SnO 2 , SiO 2 , Y 3 Al 5 O 12 , Y 3 Fe 5 O 12 , YBa 2 Cu 3 O 7 , Bi 2 Sr 2 Ca 2 Cu 3 O 10 , La 2 SrCuO 4 , Na(Co,Cu) 2 O 4 , and (Bi,Pb) Sr 3 Co 2 O 9 .

15. A method according to claim 2 , wherein said ceramic raw material powder includes at least one of Pb(Zr,Ti)O 3 , Pb(Mg 1/3 Nb 2/3 )O 3 , Pb(Zn 1/3 Nb 2/3 )O 3 , Pb(Ni 1/3 Nb 2/3 )O 3 , (Pb,La)(Zr,Ti)O 3 , MgO, SiC, Si 3 N 4 , Al 2 O 3 , TiC, B 4 C, BN, Fe 2 O 3 , (Mn,Zn)Fe 2 O 4 , Ta 2 O 5 , Nb 2 O 5 , PbTiO 3 , (Ca,Ba,Sr)TiO 3 , (Li,K)(Nb,Ta)O 3 , SrBi 2 (Ta,Nb) 2 O 9 , Bi 4 Ti 3 O 12 , ZrO 2 , SnO 2 , ZnO, La(Cr,Mn)O 3 , TiO 2 , IrO 2 , LaNiO 3 , (Ca,Sr,Ba)RuO 3 , In—SnO 2 , SiO 2 , Y 3 Al 5 O 12 , Y 3 Fe 5 O 12 , YBa 2 Cu 3 O 7 , Bi 2 Sr 2 Ca 2 Cu 3 O 10 , La 2 SrCuO 4 , Na(Co,Cu) 2 O 4 , and (Bi,Pb)Sr 3 CO 2 O 9 .

16. A method according to claim 1 , wherein a degree of crystallinity of said ceramic raw material powder is not larger than 50%.

17. A method according to claim 1 , wherein step (b) includes depositing said ceramic raw material powder on a single-crystal substrate to form the ceramic film according to orientation of said single-crystal substrate.

18. A method according to claim 2 , wherein step (b) includes depositing said ceramic raw material powder on a single-crystal substrate to form the ceramic film according to orientation of said single-crystal substrate.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 15, 2007
From: FUJIFILM HOLDINGS CORPORATION (FORMERLY FUJI PHOTO FILM CO., LTD.)
To: FUJIFILM CORPORATION
Reel/Frame 018904/0001 →