Light exposure apparatus
View Patent ↗A light exposure apparatus includes a chuck adapted to receive a substrate on a surface thereof, a plurality of first lift pins in the chuck that are able to move up and down to load/unload the substrate on/from the chuck, and a plurality of second lift pins in the chuck to discharge electrostatic charges of the chuck and the substrate.
1. A light exposure apparatus for fabricating a substrate of a liquid crystal panel, comprising:
a chuck adapted to receive the substrate of the liquid crystal panel on a surface of the chuck;
a plurality of first lift pins in the chuck that are able to move up and down to load/unload the substrate on/from the surface of the chuck, the plurality of first lift pins symmetrically arranged in a center portion of the chuck; and
a plurality of second lift pins in the chuck to discharge electrostatic charges of the chuck and the substrate, wherein each of the plurality of second lift pins includes a plate contacting the substrate, a supporter supporting and contacting a lower surface of the plate, and an elastic body contacting a lower surface of the supporter to elastically move up and down each of the plurality of second lift pins, and wherein the plate has a first diameter and the supporter has a second diameter smaller than the first diameter,
wherein a burden of the plurality of first lift pins is reduced such that the plurality of second lift pins take a part of a weight of the substrate when the substrate is loaded on the chuck and raise the substrate when the substrate is unloaded from the chuck, and wherein an up position of the plurality of first lift pins is higher than an up position of the second lift pins and a down position of the plurality of first lift pins is the same as a down position of the plurality of second lift pins.
2. The apparatus according to claim 1 , wherein each of the plurality of second lift pins includes a ground line to discharge the electrostatic charges.
3. The apparatus according to claim 1 , wherein the plurality of second lift pins are able to move up and down elastically.
4. The apparatus according to claim 1 , wherein the plurality of second lift pins are arranged corresponding to edge portions of the substrate.
5. The apparatus according to claim 3 , wherein the plurality of second lift pins have surfaces at the same position as the surface of the chuck when the substrate is attached to the surface of the chuck.
6. The apparatus according to claim 5 , wherein the surfaces of the plurality of second lift pins are able to be lifted by about 10 mm.
7. The apparatus according to claim 1 , wherein the plate includes a diameter of about 30 mm and the supporter includes a diameter of about 20 mm.
8. The apparatus according to claim 1 , further comprising a plurality of vacuum holes in the chuck to closely adhere the substrate to the surface of the chuck.
9. An apparatus for fabricating a substrate, comprising:
a chuck adapted to receive the substrate on a surface thereof;
a plurality of first lift pins in the chuck to move up and down to load/unload the substrate on/from the surface of the chuck, the plurality of first lift pins symmetrically arranged in a center portion of the chuck; and
a plurality of second lift pins in the chuck to discharge electrostatic charges of the chuck and the substrate, wherein each of the plurality of second lift pins includes a plate contacting the substrate, a supporter supporting and contacting a lower surface of the plate, and an elastic body contacting a lower surface of the supporter to elastically move up and down each of the plurality of second lift pins, and wherein the plate has a first diameter and the supporter has a second diameter smaller than the first diameter,
wherein a burden of the plurality of first lift pins is reduced such that the plurality of second lift pins take a part of a weight of the substrate when the substrate is loaded on the chuck and raise the substrate when the substrate is unloaded from the chuck and wherein an up position of the plurality of first lift pins is higher than an up position of the second lift pins and a down position of the plurality of first lift pins is the same as a down position of the plurality of second lift pins.
10. The apparatus according to claim 9 , wherein each of the plurality of second lift pins includes a ground line to discharge the electrostatic charges.
11. The apparatus according to claim 9 , wherein the plurality of second lift pins are able to move up and down elastically.
12. The apparatus according to claim 9 , wherein the plurality of second lift pins are arranged corresponding to edge portions of the substrate.
13. The apparatus according to claim 9 , further comprising a plurality of vacuum holes in the chuck to closely adhere the substrate to the surface of the chuck.
14. A light exposure apparatus for fabricating a substrate of a liquid crystal panel, comprising:
a light source adapted to emit ultra-violet light;
a photo mask including predetermined patterns that selectively transmit and block the light emitted from the light source;
a chuck adapted to support the substrate that is exposed to the light through the photo mask;
a plurality of first lift pins in the chuck that are able to move up and down to load/unload the substrate on/from the chuck, the plurality of first lift pins symmetrically arranged in a center portion of the chuck;
a plurality of second lift pins in the chuck to discharge electrostatic charges of the chuck and the substrate, wherein each of the plurality of second lift pins includes a plate contacting the substrate, a supporter supporting and contacting a lower surface of the plate, and an elastic body contacting a lower surface of the supporter to elastically move up and down each of the plurality of second lift pins, and wherein the plate has a first diameter and the supporter has a second diameter smaller than the first diameter,
wherein a burden of the plurality of first lift pins is reduced such that the plurality of second lift pins take a part of a weight of the substrate when the substrate is loaded on the chuck and raise the substrate when the substrate is unloaded from the chuck, and wherein an up position of the plurality of first lift pins is higher than an up position of the second lift pins and a down position of the plurality of first lift pins is the same as a down position of the plurality of second lift pins.
15. The apparatus according to claim 14 , wherein the plurality of second lift pins are able to move up and down elastically.
16. The apparatus according to claim 15 , wherein each of the plurality of second lift pins includes a ground line to discharge the electrostatic charges.
17. The apparatus according to claim 15 , wherein the plurality of second lift pins have surfaces positioned at a same level as the surface of the chuck when the substrate is placed on the chuck and positioned at a higher level than the surface of the chuck when the substrate is unloaded from the chuck.
18. The apparatus according to claim 17 , wherein the surfaces of the plurality of second lift pins are able to be lifted by about 10 mm.