Liquid crystal display device and method of fabricating the same

1. A liquid crystal display device, comprising:

a gate line and a data line formed on a substrate;

a thin film transistor formed at an intersection of the gate line and the data line;

a pixel electrode connected to the thin film transistor;

a common electrode substantially parallel to the pixel electrode;

a first transparent conductive pattern directly contacted with a surface of the common electrode substantially nonparallel to a plane of the substrate, wherein the common electrode and the first transparent conductive pattern are located at an outermost of a pixel area;

a common line substantially parallel to the gate line and commonly connected to the common electrode to supply a common voltage to the common electrode; and

a second transparent conductive pattern located at a central portion of the pixel area separated from the first transparent conductive pattern, wherein the second transparent conductive pattern is contacted with a surface of the common line substantially nonparallel to the plane of the substrate, and not overlapped with a surface of the common line substantially parallel to the plane of the substrate,

wherein at least a part of the first transparent conductive pattern is contacted with only the surface of the common electrode substantially nonparallel to a plane of the substrate, and

wherein the first and second transparent conductive patterns are made of only transparent electrode material and not overlapped with the pixel electrode.

2. The liquid crystal display device according to claim 1 , wherein the second transparent conductive pattern is made of the same material as the first transparent conductive pattern and the pixel electrode.

3. The liquid crystal display device according to claim 1 , wherein the common electrode in contact with the first and second transparent conductive patterns is made of the same material as the gate line.

4. A method for forming a liquid crystal display device, comprising:

forming a gate line and a data line on a substrate, and a common line substantially parallel to the gate line;

forming a thin film transistor at an intersection of the gate line and the data line;

forming a pixel electrode connected to the thin film transistor;

forming a common electrode substantially parallel to the pixel electrode; and

forming a first transparent conductive pattern directly contacted with a surface of the common electrode substantially nonparallel to a plane of the substrate, and a second transparent conductive pattern in a pixel area separated from the first transparent conductive pattern,

wherein the common electrode and the first transparent conductive pattern are located at an outermost of the pixel area,

wherein at least a part of the first transparent conductive pattern is contacted with only the surface of the common electrode substantially nonparallel to a plane of the substrate,

wherein the second transparent conductive pattern is located at a central portion of the pixel area,

wherein the second transparent conductive pattern is contacted with the surface of the common line substantially nonparallel to the plane of the substrate, and not overlapped with a surface of the common line substantially parallel to the plane of the substrate, and

wherein the first and second transparent conductive patterns are made of only transparent electrode material and not overlapped with the pixel electrode.