IP Library Patent Application 11300552
Patent Application
App. No. 11/300,552

Method and apparatus for nanoscale surface analysis using soft X-rays

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Quick Facts
Patent No.
US None
App. No.
11/300,552
Abstract

A nano-scale surface analysis system comprises an electrically powered apparatus for the generation of soft x-ray laser radiation. The apparatus comprises an excitation circuit having at least two or more electrically conducting structures separated by a liquid dielectric for providing a high current excitation pulse, and a capillary structure having a capillary with a length to diameter ration of about 20 to 1000 for enclosing a selected lasing material, wherein the excitation circuit is capable of generating a plasma volume within the capillary structure to produce a population inversion. The generator further comprises a focusing optic for receiving the soft x-ray radiation from the emissions source and focus the soft x-ray radiation onto a target for forming a nanoplasma, the soft x-ray radiation being focused onto an area of the target having a diameter of less than 100 nm.

Claims (32)

1 . A nano-scale surface analysis system, comprising:

a emissions source configured to emit short-wavelength radiation; and

a focusing optic for receiving the short-wavelength radiation from the emissions source and focus the radiation onto a target, the radiation being focused onto an area of the target having a diameter of less than 200 nm.

2 . The nano-scale surface analysis system of claim 1 , wherein the emissions source comprises a short-pulse laser system for generating a laser pulse having an energy density sufficient to form a point plasma at a short-wavelength radiation source, wherein the radiation source emits short-wavelength radiation from the point plasma when illuminated by the laser pulse.

3 . The nano-scale surface analysis system of claim 1 , wherein the emissions source comprises an electrical powered apparatus for the generation of soft x-ray laser radiation.

4 . The nano-scale surface analysis system of claim 3 , wherein the apparatus comprises an excitation circuit having at least two or more electrically conducting structures separated by a liquid dielectric for providing a high current excitation pulse.

5 . The nano-scale surface analysis system of claim 4 , wherein the apparatus further comprises a capillary structure having a capillary with a length to diameter ration of about 20 to 1000 for enclosing a selected lasing material, wherein the excitation circuit is capable of generating a plasma volume within the capillary structure to produce a population inversion.

6 . The nano-scale surface analysis system of claim 5 , wherein the apparatus further comprises a circuit configured to pre-ionize the selected lasing material prior to the fast high current excitation pulse.

7 . The nano-scale surface analysis system of claim 1 , wherein the short-wavelength radiation has a wavelength in a range of 1 nm to 15 nm.

8 . The nano-scale surface analysis system of claim 7 , wherein the short-wavelength radiation has a wavelength greater than 8 nm.

9 . The nano-scale surface analysis system of claim 1 , wherein the soft x-ray radiation has a wavelength in a range of 40-50 nanometers, e.g., approximately.

10 . The nano-scale surface analysis system of claim 9 , wherein the soft x-ray radiation has a wavelength of approximately 46.9 nanometers.

11 . The nano-scale surface analysis system of claim 1 , wherein said focusing optic includes Bragg multilayer coatings.

12 . The nano-scale surface analysis system of claim 1 , wherein said focusing optic includes at least one of a grazing incidence optical element or a diffractive optical element.

13 . The nano-scale surface analysis system of claim 1 , wherein the focusing optic is for focusing the radiation onto an area of the target having a diameter less than 100 nm.

14 . The nano-scale surface analysis system of claim 1 , further comprising a positioning stage for positioning the target.

15 . A nano-scale surface analysis system, comprising:

an electrical powered apparatus for the generation of soft x-ray laser radiation, the apparatus comprising:

an excitation circuit having at least two or more electrically conducting structures separated by a liquid dielectric for providing a high current excitation pulse, and

a capillary structure having a capillary with a length to diameter ration of about 20 to 1000 for enclosing a selected lasing material, wherein the excitation circuit is capable of generating a plasma volume within the capillary structure to produce a population inversion; and

a focusing optic for receiving the soft x-ray radiation from the emissions source and focus the soft x-ray radiation onto a target, the soft x-ray radiation being focused onto an area of the target having a diameter of less than 100 nm.

16 . The nano-scale surface analysis system of claim 15 , wherein the apparatus further comprises a circuit configured to pre-ionize the selected lasing material prior to the fast high current excitation pulse.

17 . The nano-scale surface analysis system of claim 15 , wherein the soft x-ray radiation has a wavelength in a range of 40-50 nanometers, e.g., approximately.

18 . The nano-scale surface analysis system of claim 17 , wherein the soft x-ray radiation has a wavelength of approximately 46.9 nanometers.

19 . The nano-scale surface analysis system of claim 15 , wherein the focusing optic comprises a free standing zone plate.

20 . The nano-scale surface analysis system of claim 19 , wherein the free standing zone plate comprises a zone plate transmission efficiency of 10%.

21 . The nano-scale surface analysis system of claim 19 , wherein the free standing zone plate comprises an outermost delta (r) at 200 nanometers.

22 . The nano-scale surface analysis system of claim 19 , wherein the free standing zone plate comprises 625 zones.

23 . The nano-scale surface analysis system of claim 19 , wherein the free standing zone plate comprises a diameter of 500 microns.

24 . The nano-scale surface analysis system of claim 19 , wherein the free standing zone plate comprises a focal length of 2.1 millimeters.

25 . The nano-scale surface analysis system of claim 19 , wherein the free standing zone plate comprises an F number of 4.2.

26 . The nano-scale surface analysis system of claim 19 , wherein the free standing zone plate comprises a spectral resolution (Delta Lambda/Lambda) of 0.0016.

Assignments (4)
INTELLECTUAL PROPERTY SECURITY AGREEMENT Recorded May 11, 2009
From: JMAR, LLC
To: LV ADMINISTRATIVE SERVICES, INC.
Reel/Frame 022659/0864 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 7, 2009
From: JMAR TECHNOLOGIES, INC., A DELAWARE CORPORATION; JMAR RESEARCH, INC., A CALIFORNIA CORPORATION; JMAR/SAL NANOLITHOGRAPHY, INC., A CALIFORNIA CORPORATION; JSI MICROELECTRONICS, INC., A CALIFORNIA CORPORATION
To: JMAR, LLC, A DELAWARE LIMITED LIABILITY COMPANY
Reel/Frame 022645/0804 →
GRANT OF SECURITY INTEREST IN PATENTS AND TRADEMARKS Recorded Apr 30, 2007
From: JMAR RESEARCH, INC. (F/K/A JAMAR TECHNOLOGY CO. AND F/K/A JMAR TECHNOLOGY CO., A DELAWARE CORPORATION)
To: LAURUS MASTER FUND, LTD.
Reel/Frame 019224/0176 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 28, 2006
From: BLOOM, SCOTT H.; HEMBERG, OSCAR
To: JMAR RESEARCH, INC.
Reel/Frame 017558/0911 →