Method of producing a thin-film resonator
View Patent ↗A thin-film resonator and a method for producing a thin-film component includes, for the purpose of structuring an upper first dielectric layer, a mask that comprises a second dielectric layer facing the upper dielectric layer and a photoresist layer. Initially, the photoresist layer that serves as photomask during the structuring of the second dielectric layer is structured. The structures of the second dielectric layer, together with the structures of the photoresist layer located thereabove, form a mask that is used for structuring the first dielectric layer.
1. A method for producing a multi-layer component, which comprises:
A) providing a multi-layer system with an uppermost layer formed by a first dielectric layer;
B) applying a Si-containing second dielectric layer directly onto and in contact with the first dielectric layer and a photoresist layer onto the second dielectric layer;
C) structuring the photoresist layer to form a first mask;
D) structuring the second dielectric layer with aid of the first mask, whereby structures of the second dielectric layer together with structures of the first mask located there above form a second mask;
E) structuring the first dielectric layer with aid of the second mask;
F) removing the photoresist layer;
G) permitting the second dielectric layer of the second mask to remain on the multi-layer system; and
H) utilizing the second dielectric layer of the second mask as a functional layer of the multi-layer system.
2. The method according to claim 1 , which further comprises providing a piezoelectric layer as the first dielectric layer.
3. The method according to claim 2 , which further comprises carrying out the structuring step E) by structuring the piezoelectric layer into thin-film resonators.
4. The method according to claim 3 , which further comprises: after step F):
structuring the second dielectric layer further to form lateral edge structures each surrounding an exposed edge region of the first dielectric layer of one of the thin-film resonators; and
producing upper electrodes that each cover the exposed edge region and at least partly cover the edge structures.
5. The method according to claim 1 , which further comprises wet-etching at least one of the first dielectric layer and the second dielectric layer.
6. The method according to claim 1 , which further comprises carrying out the production of the second dielectric layer by chemically vapor depositing tetra-ethyl-ortho-silicate to produce a layer of silicon oxide as the second dielectric layer.
7. The method according to claim 1 , which further comprises providing the second dielectric layer as a layer of one of silicon nitride and silicon carbide.
8. The method according to claim 1 , which further comprises providing the first dielectric layer as a layer of aluminum nitride.
9. A method for producing a multi-layer component, which comprises:
A) providing a multi-layer system with an uppermost layer formed by a first dielectric layer;
B) applying a Si-containing second dielectric layer onto the first dielectric layer and a photoresist layer onto the second dielectric layer;
C) structuring the photoresist layer to form a first mask;
D) structuring the second dielectric layer with aid of the first mask, whereby structures of the second dielectric layer together with structures of the first mask located there above form a second mask;
E) structuring the first dielectric layer with aid of the second mask;
F) removing the photoresist layer;
G) permitting the second dielectric layer of the second mask to remain on the multi-layer system; and
H) utilizing the second dielectric layer of the second mask as a functional layer of the multi-layer system,
and further comprises: after carrying out the photoresist removing step F) to expose the first dielectric layer, completely removing the second dielectric layer and producing upper electrodes above the exposed first dielectric layer.