Shadow mask for cathode ray tubes
View Patent ↗Disclosed herein is a shadow mask for cathode ray tubes. When the width of a smaller hole part of each of slots formed at the shadow mask is defined as Sw, the horizontal distance between the end of a taper-shaped larger hole part facing the panel side of each of the slots, which is adjacent to the edge part of the shadow mask, and the end of the smaller hole part, which is adjacent to the edge part of the shadow mask, is defined as Ta, and the incident angle at which the electron beam passes through each of the slots is defined as θ, the shadow mask has at least one slot through which the electron beam passes at an incident angle θ of above 47 degrees, and the at least one slot through which the electron beam passes at an incident angle θ of above 47 degrees is configured such that the following inequality is satisfied: 1<Ta/Sw<2.
1. A shadow mask for cathode ray tubes, the shadow mask having a plurality of slots through which an electron beam passes for sorting colors of the electron beam, wherein
when the width of a smaller hole part of each of the slots through which the electron beam passes is defined as Sw, the horizontal distance between the end of a taper-shaped larger hole part facing the panel side of each of the slots, which is adjacent to the edge part of the shadow mask, and the end of the smaller hole part, which is adjacent to the edge part of the shadow mask, is defined as Ta, and the incident angle at which the electron beam passes through each of the slots is defined as θ,
the shadow mask has at least one slot through which the electron beam passes at an incident angle θ of above 47 degrees, and the at least one slot through which the electron beam passes at an incident angle θ of above 47 degrees is configured such that the following inequality is satisfied:
1< Ta/Sw< 2.
2. The mask as set forth in claim 1 , wherein
when the thickness of the shadow mask is defined as t,
the at least one slot of the shadow mask is configured such that the following inequality is further satisfied:
1< Ta/t< 2.
3. The mask as set forth in claim 1 , wherein the at least one slot of the shadow mask is configured such that the following inequality is further satisfied:
Ta<0.380 mm.
4. The mask as set forth in claim 1 , wherein the end of the larger hole part, which is adjacent to the center part of the shadow mask, is protruded toward the center of the at least one slot.
5. The mask as set forth in claim 4 , wherein
the end of the larger hole part, which is adjacent to the center part of the shadow mask, is located nearer to the center part of the shadow mask than the center of the smaller hole part, and
when the horizontal distance between the end of the larger hole part, which is adjacent to the center part of the shadow mask, and the center of the smaller hole part is defined as Di,
the at least one slot is configured such that the following inequality is satisfied:
0≦ Di≦Sw/ 2.
6. The mask as set forth in claim 4 , wherein
the end of the larger hole part, which is adjacent to the center part of the shadow mask, is located nearer to the edge part of the shadow mask than the center of the smaller hole part, and
when the width of the larger hole part is defined as D,
the at least one slot is configured such that the following inequality is satisfied:
D≧Sw.
7. The mask as set forth in claim 4 , wherein
when the width of the larger hole part is defined as D and the thickness of the shadow mask is defined as t,
the at least one slot is configured such that the following inequality is satisfied:
D≦ 2.5× t.
8. The mask as set forth in claim 1 , wherein
when the horizontal distance from the center of one slot of the shadow mask to the center of another adjacent slot is defined as Ph,
the shadow mask is configured such that Ph(A) of the center part of the shadow mask and Ph(F) of the catercornered end of the effective surface of the shadow mask satisfy the following inequality.
140%≦ F/A≦ 180%.
9. The mask as set forth in claim 8 , wherein
when Ph of the end of the effective surface of the shadow mask in the direction of the major axis is defined as D,
the shadow mask is configured such that the following inequality is satisfied:
140%≦ D/A≦ 180%.
10. The mask as set forth in claim 8 , wherein
when Ph at the position corresponding to ½ of the distance from the center part of the shadow mask to the end of the shadow mask in the direction of the minor axis is defined as B, and Ph at the position corresponding to ½ of the distance from the end of the effective surface of the shadow mask in the direction of the major axis to the end of the shadow mask in the direction of the minor axis is defined as E,
the shadow mask is configured such that the following inequality is satisfied:
140%≦ E/B≦ 180%.
11. The mask as set forth in claim 8 , wherein
when Ph at the end of the effective surface of the shadow mask in the direction of the minor axis is defined as C,
the shadow mask is configured such that the following inequality is satisfied:
140%≦ F/C≦ 180%.
12. The mask as set forth in claim 8 , wherein the shadow mask is configured such that Ph(A) of the center part of the shadow mask and Ph(F) of the catercornered end of the effective surface of the shadow mask further satisfy the following inequality:
150%≦ F/A≦ 180%.
13. The mask as set forth in claim 1 , wherein the shadow mask is applied to a slim-type cathode ray tube having a deflection angle of 120 degrees or more.
14. A shadow mask for cathode ray tubes, the shadow mask having a plurality of slots through which an electron beam passes for sorting colors of the electron beam, wherein
each of the slots includes a smaller hole part having the narrowest width and a larger hole part facing the panel side of each of the slots, and
the end of the larger hole part, which is adjacent to the center part of the shadow mask, is protruded toward the center of each of the slots such that an area of each of the slots is decreased to increase the structural strength of the shadow mask, wherein
the end of the larger hole part, which is adjacent to the center part of the shadow mask, is located nearer to the center part of the shadow mask than the center of the smaller hole part, and
when the width of the smaller hole part is defined as Sw, and the horizontal distance between the end of the larger hole part, which is adjacent to the center part of the shadow mask, and the center of the smaller hole part is defined as Di,
the shadow mask is configured such that the following inequality is satisfied:
0≦ Di≦Sw/ 2.
15. A shadow mask for cathode ray tubes, the shadow mask having a plurality of slots through which an electron beam passes for sorting colors of the electron beam, wherein
each of the slots includes a smaller hole part having the narrowest width and a larger hole part facing the panel side of each of the slots, and
the end of the larger hole part, which is adjacent to the center part of the shadow mask, is protruded toward the center of each of the slots such that an area of each of the slots is decreased to increase the structural strength of the shadow mask, wherein
the end of the larger hole part, which is adjacent to the center part of the shadow mask, is located nearer to the edge part of the shadow mask than the center of the smaller hole part, and
when the width of the smaller hole part is defined as Sw, and the width of the larger hole part is defined as D,
the shadow mask is configured such that the following inequality is satisfied:
D≧Sw.