Sputtered ruthenium oxide coatings in electrolytic capacitor
View Patent ↗A capacitor is described. the capacitor includes a casing; a cathode of an active material of at least an oxide of a first metal provided on a substrate, wherein the active material is characterized as being of a substantially homogeneous coating formed by sputtering a target of the first metal in a vacuum chamber; an anode spaced from the cathode coating; and an electrolyte in contact with the cathode coating and the anode. The casing contains the anode, the cathode and the electrolyte. A method and apparatus for providing the sputtered coating is also disclosed.
1. A method for providing a capacitor, comprising the steps of:
a) providing a casing comprising a first casing portion and a second casing portion;
b) positioning at least one of the first and second casing portions in a sputter deposition apparatus;
c) sputtering a target comprised of a first metal in a vacuum chamber of the sputter deposition apparatus, thereby providing a substantially homogeneous coating of the first metal on at least a portion of the at least one casing portion;
d) housing an anode inside one of the first and second casing portions spaced from the cathode;
e) mating the first casing portion to the second casing portion, thereby housing the anode and the cathode therein spaced from each other; and
f) providing an electrolyte in the casing contacting the cathode and the anode.
2. The method of claim 1 including providing the cathode coating having a thickness of from about 0.1 micrometers to about 5 micrometers.
3. The method of claim 1 including selecting the first metal from the group consisting of ruthenium, cobalt, manganese, molybdenum, tungsten, tantalum, iron, niobium, iridium, titanium, zirconium, hafnium, rhodium, vanadium, osmium, palladium, platinum, nickel, lead, and mixtures thereof.
4. The method of claim 1 including introducing a gaseous material into the vacuum chamber to provide the homogeneous coating of the first metal as a compound thereof.
5. The method of claim 1 including providing the target consisting essentially of ruthenium as the first metal reactively sputtered in an oxygen-containing atmosphere in the vacuum chamber to provide the coating being of ruthenium oxide.
6. The method of claim 1 including providing the target consisting essentially of ruthenium dioxide.
7. The method of claim 1 including selecting the first and second casing portions from a second metal selected from the group consisting of titanium, tantalum, molybdenum, niobium, cobalt, nickel, stainless steel, tungsten, platinum, palladium, gold, silver, copper, chromium, vanadium, aluminum, zirconium, hafnium, zinc, iron, and mixtures and alloys thereof.
8. The method of claim 1 including supporting the one of the first and second casing portions on a holder in the vacuum chamber, wherein the holder is provided with an electrical potential with respect to the casing portion selected from the group consisting of being electrically grounded, electrically isolated, and electrically biased.
9. The method of claim 1 including electrically connecting the target to a high voltage power supply that provides one of the group consisting of a direct current continuous voltage, pulsed voltage, and alternating current voltage to the target.
10. The method of claim 1 including providing the capacitor devoid of a separator intermediate the anode and the cathode.
11. The method of claim 1 including providing the capacitor as an electrolytic type having the cathode associated with a tantalum anode.