Printing plate and patterning method using the same
View Patent ↗A patterning method includes depositing a pattern target layer on a surface of a substrate, providing a printing plate with concaves in a first side of a transparent substrate and an opaque layer on the first side except in the concaves of the first sides, filling resins into the concaves of the printing plate, positioning the substrate of the printing plate to correspond to an upper portion of the pattern target layer, and transferring resins of the printing plate onto the pattern target layer by exposing resins to a curing light to harden resins.
1. A patterning method comprising the following sequence:
a. depositing a pattern target layer on a surface of a substrate;
b. providing a printing plate with concaves in a first side of a transparent substrate and an opaque layer on the first side except in the concaves of the first sides;
c. filling resins into the concaves of the printing plate;
d. positioning the substrate of the printing plate to correspond to an upper portion of the pattern target layer; and
e. transferring the resins of the printing plate onto the pattern target layer by exposing a rear surface of the printing plate to harden the resins.
2. The patterning method according to claim 1 , further comprising:
removing non-hardened resins with a developing process.
3. The patterning method according to claim 2 , wherein the developing process uses developing solution to dissolve the non-hardened resins only.
4. The patterning method according to claim 2 , further comprising:
etching the pattern target layer using the hardened resins as masks; and
removing the hardened resins.
5. The patterning method according to claim 2 , further comprising:
curing the hardened resins after the developing process to increase hardness of the hardened resins.
6. The patterning method according to claim 1 , wherein the resins are negative photoresist resins.
7. The patterning method according to claim 1 , wherein the resins are color filter resins.
8. The patterning method according to claim 1 , wherein the resins are negative color filter resins.
9. The patterning method as claimed in claim 1 , wherein the pattern target layer is one of metal, semiconductor and insulating layers.
10. A patterning method comprising the following sequence:
a. depositing a pattern target layer on a surface of a substrate;
b. providing a printing plate with concaves in a first side of a transparent substrate and an opaque layer on the first side except in the concaves of the first side;
c. filling photoresist resins into the concaves of the printing plate;
d. positioning the substrate of the printing plate to correspond to an upper portion of the pattern target layer;
e. transferring the photoresist resins of the printing plate onto the pattern target layer by exposing a rear surface of the printing plate to harden the photoresist resins;
f. removing non-hardened photoresist resins using a solution that dissolves the non-hardened photoresist resins while not affecting the hardened photoresist resins;
g. etching the pattern target layer using the hardened photoresist resins as masks; and
h. removing the hardened resins.
11. The patterning method according to claim 10 , further comprising:
curing the hardened resins after removing non-hardened photoresist resins to improve hardness of the hardened resins.
12. The patterning method as claimed in claim 10 , wherein the pattern target layer is one of metal, semiconductor and insulating layers.
13. The patterning method as claimed in claim 10 , wherein the pattern target layer has a contact hole.