Method of carrying out an exposure process for a liquid crystal display device
View Patent ↗An apparatus for manufacturing a liquid crystal display device is disclosed. A first robot arm at a loading side of the thru-conveyor receives a substrate coated with photoresist and conveys the substrate to a thru-conveyor. A softbake hot plate (SHP) at the unloading side of the thru-conveyor removes solvent from the substrate. A cool plate lowers the substrate temperature from which the solvent is removed. A buffer temporarily stores the substrate having the lowered temperature. A second robot arm between the thru-conveyor, the SHP, the cool plate and a loading side of the buffer, loads/unloads the substrate. A temperature control unit adjusts the substrate temperature unloaded from the buffer. A third robot arm between the unloading side of the buffer, the temperature control unit and an exposure unit that exposes the substrate, loads/unloads the substrate.
1. A method of carrying out an exposure process for a liquid crystal display device comprising:
conveying a substrate coated with photoresist to a thru-conveyor using a first robot arm;
unloading the substrate from the thru-conveyor and conveying the substrate to a hot plate using a second robot arm;
removing solvent from the substrate at the hot plate;
after removing solvent, conveying the substrate to a cold plate using the second robot arm;
lowering a temperature of the substrate at the cold plate;
after lowering the temperature, conveying the substrate to a buffer using the second robot arm;
temporarily storing the substrate in the buffer;
after storing, conveying the substrate to a temperature control unit by a third robot arm;
adjusting the temperature of the substrate in the temperature control unit;
after adjusting the temperature, conveying the substrate to the exposure unit using the third robot arm;
exposing the substrate to ultraviolet radiation in the exposure unit.
2. The method of claim 1 , further comprising, after exposing the substrate to ultraviolet radiation, conveying the substrate to a titler using the third robot arm.