Fluorescence measurement apparatus
View Patent ↗On a substrate 41 holding a sample to be detected, a dielectric multilayer 42 is disposed which reflects excitation light e 1 supplied from above the substrate 41 and transmits fluorescence f 1 emitted from the sample, and the excitation light e 1 is reflected at the dielectric multilayer 42 while the transmitted fluorescence f 1 is detected by a light receiving unit 44 , thereby providing a fluorescence measurement apparatus which can resolve a problem of reduction in detection sensitivity due to autofluorescence from the substrate or leakage of the excitation light from a light receiving filter, and which can detect the sample with high sensitivity.
1. A fluorescence measurement apparatus, comprising:
a substrate arranged to hold a sample that emits fluorescence when being irradiated with excitation light, said substrate having a well or a channel formed in an upper portion of said substrate;
wavelength selection means for reflecting the excitation light and transmitting the fluorescence, said wavelength selection means being formed on an upper surface of said substrate and at a bottom surface of said well or said channel; and
a light receiving unit for detecting fluorescence emitted by the sample which has passed through said wavelength selection means, said light receiving unit being disposed beneath said substrate,
wherein the sample is disposed in the well or the channel in which said wavelength selection means is formed, and wherein the excitation light irradiates the sample from above said substrate.
2. A fluorescence measurement apparatus according to claim 1 , wherein said wavelength selection means comprises a layer formed on the upper surface of the substrate.
3. A fluorescence measurement apparatus according to claim 2 , wherein said layer comprises a dielectric multilayer.
4. A fluorescence measurement apparatus according to claim 3 , wherein said dielectric multilayer comprises at least one dielectric material having a high refractive index and at least one dielectric material having a refractive index lower than that of the at least one dielectric material having the high refractive index alternately deposited on said substrate.
5. A fluorescence measurement apparatus according to claim 1 , wherein said wavelength selection means comprises titanium dioxide layers and silicon dioxide layers which are alternately deposited.
6. A fluorescence measurement apparatus according to claim 1 , further comprising:
a filter for transmitting only the fluorescence that has been emitted from the sample and has passed through said wavelength selection means, said filter being disposed between said substrate and said light receiving unit.
7. A fluorescence measurement apparatus according to claim 1 , wherein said substrate comprises a high-polymer material.
8. A fluorescence measurement apparatus according to claim 1 , further comprising:
a top plate having, on a surface of said top plate, a reflection layer for reflecting the excitation light, said top plate being arranged such that said reflection layer faces said substrate, and such that the excitation light is reflected multiple times in the sample by said wavelength selection means and said reflection layer.
9. A fluorescence measurement apparatus, comprising:
a substrate arranged to hold a sample that emits fluorescence when being irradiated with excitation light, said substrate having a well or a channel formed in an upper portion of said substrate;
wavelength selection means for reflecting the excitation light and transmitting the fluorescence, said wavelength selection means being formed on an upper surface of said substrate and at a bottom surface and inner side surfaces of said well or said channel; and
a light receiving unit for detecting fluorescence emitted by the sample which has passed through said wavelength selection means, said light receiving unit being disposed beneath said substrate,
wherein the sample is disposed in the well or the channel in which said wavelength selection means is formed, and wherein the excitation light irradiates the sample from above said substrate.
10. A fluorescence measurement apparatus according to claim 9 , further comprising:
a top plate having, on a surface of said top plate, a reflection layer for reflecting the excitation light, said top plate being arranged such that said reflection layer faces said substrate, and such that the excitation light is reflected multiple times in the sample by said wavelength selection means and said reflection layer.
11. A fluorescence measurement apparatus according to claim 9 , wherein said wavelength selection means comprises a layer formed on the upper surface of the substrate.
12. A fluorescence measurement apparatus according to claim 11 , wherein said layer comprises a dielectric multilayer.
13. A fluorescence measurement apparatus according to claim 12 , wherein said dielectric multilayer comprises at least one dielectric material having a high refractive index and at least one dielectric material having a refractive index lower than that of the at least one dielectric material having the high refractive index alternately deposited on said substrate.
14. A fluorescence measurement apparatus according to claim 9 , wherein said wavelength selection means comprises titanium dioxide layers and silicon dioxide layers which are alternately deposited.
15. A fluorescence measurement apparatus according to claim 9 , further comprising:
a filter for transmitting only the fluorescence that has been emitted from the sample and has passed through said wavelength selection means, said filter being disposed between said substrate and said light receiving unit.
16. A fluorescence measurement apparatus according to claim 9 , wherein said substrate comprises a high-polymer material.