High reliability etched-facet photonic devices

1. A photonic device comprising:

a substrate;

a semiconductor structure on said substrate;

a protective layer; and

a metallization layer;

said semiconductor structure comprising:

a top surface;

an active layer located below said top surface;

a cladding region located below said active layer;

at least one etched facet defining at least one side surface of said semiconductor structure; and

at least one etched wall defining remaining side surfaces of said semiconductor structure;

wherein said side surfaces are formed on a first portion of said semiconductor structure including said active layer and a second portion of said semiconductor structure extends laterally beyond said side surfaces;

wherein said protective layer is a single continuous layer of deposited dielectric material completely covering said side surfaces and said top surface of said semiconductor structure except for a contact window defined by said protective layer on said top surface of said semiconductor structure, wherein said contact window is spaced away from and does not extend to said side surfaces;

wherein said metallization layer completely covers said contact window and extends over onto said protective layer to completely seal said contact window;

wherein said single continuous layer of deposited dielectric material also extends over said substrate and completely covers said substrate within 750 nm of said at least one etched facet.

2. The photonic device of claim 1 , wherein said at least one etched facet is formed by a dry etching process.

3. The photonic device of claim 1 , wherein said substrate is InP.

4. The photonic device of claim 1 , wherein said substrate is GaAs.

5. The photonic device of claim 1 , wherein said substrate is GaN.

6. The photonic device of claim 1 , wherein said device is a laser.

7. The photonic device of claim 6 , wherein said laser is a ridge laser.

8. The photonic device of claim 7 , wherein said ridge laser comprises a ridge having a top surface and a plurality of side surfaces, wherein said contact window is disposed at said ridge top surface, and wherein said protective layer completely covers each of said ridge top and side surfaces except for said contact window.

9. The photonic device of claim 1 , wherein said device is an electroabsorption modulator.

10. The photonic device of claim 1 , wherein said device is a semiconductor optical amplifier.

11. The photonic device of claim 1 , wherein said protective layer is formed of silicon dioxide.

12. The photonic device of claim 1 , wherein said substrate has a singulation edge no less than about 750 nm from said at least one etched facet, and wherein said protective layer completely covers said substrate between said at least one etched facet and said singulation edge.

13. The photonic device of claim 1 , wherein said protective layer completely covers a top surface of said second portion of said semiconductor structure that extends laterally beyond said side surfaces.

14. The photonic device of claim 1 , further comprising:

a second cladding region located above said active layer.

15. The photonic device of claim 14 , further comprising:

a cap layer located above said second cladding region, said contact window exposing at least a portion of said cap layer on said top surface of said semiconductor structure.

16. The photonic device of claim 15 , wherein said metallization layer is formed at least in part on said exposed portion of said cap layer.

17. The photonic device of claim 1 , further comprising:

a contact formed on a bottom surface of said substrate opposite said semiconductor structure.