Method for manufacturing array substrate for liquid crystal display device

1. A method of fabricating an array substrate, comprising the steps of:

forming a buffer layer on a metal substrate;

forming a thin film transistor including a gate electrode, a source electrode and a drain electrode on the buffer layer;

forming a pixel electrode contacting the drain electrode;

removing the metal substrate to expose a lower surface of the buffer layer; and

forming a plastic material beneath the buffer layer such that the plastic material contacts the exposed lower surface of the buffer layer.

2. The method according to claim 1 , wherein the substrate is removed by an etchant.

3. The method according to claim 1 , wherein the step of forming a plastic material includes at least using a roller to apply the plastic material to the buffer layer.

4. The method according to claim 1 , wherein the buffer layer includes at least one of silicon oxide (SiO 2 ) and silicon nitride (SiN x ).

5. The method according to claim 1 , wherein the gate electrode includes at least one of aluminum (Al), aluminum alloy, molybdenum (Mo), and tungsten (W).

6. The method according to claim 1 , wherein the source and drain electrodes include at least one of molybdenum (Mo), tungsten (W), chromium (Cr), and an aluminum alloy.

7. The method according to claim 1 , wherein the pixel electrode includes at least one of indium-tin-oxide (ITO) and indium-zinc-oxide (IZO).

8. The method according to claim 1 , wherein the plastic material includes at least one of polycarbonate (PC) and polystyrene.