IP Library Granted Patent US 8,633,416
Granted Patent B2
US 8,633,416 · App. 11/372,996 · Granted Jan 21, 2014

Plasmas and methods of using them

View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 8,633,416
App. No.
11/372,996
Granted
Jan 21, 2014
Kind
B2
Abstract

Plasma devices and methods for using such plasma devices in analytical measurements are disclosed. In certain examples, a low flow plasma may be operative using a total argon gas flow of less than about five liters per minute, and in some embodiments, a plasma argon gas flow of less than about four liter per minute. In other examples, a plasma produced using inductive and capacitive coupling is disclosed.

Claims (28)

1. A method of generating a plasma in a torch, the method comprising:

igniting a plasma using an argon gas flow at a first flow rate and using coupling of both inductive and capacitive coupled RF energies; and

introducing a non-argon barrier gas flow into the torch.

2. The method of claim 1 , further comprising reducing the argon gas flow in the torch from the first flow rate to a second flow rate that is less than the first flow rate.

3. The method of claim 1 further comprising selecting the non-argon barrier gas flow to be nitrogen.

4. The method of claim 1 further comprising replacing about 75% of the argon gas flow with the non-argon barrier gas flow.

5. The method of claim 1 further configuring the capacitive coupling to increase ionization potential of the plasma to at least about 25 eV.

6. The method of claim 1 further comprising configuring the torch with a first plate and a second plate to provide the capacitive coupling.

7. A method comprising providing inductive coupling and capacitive coupling to a plasma to increase the ionization potential of the plasma.

8. The method of claim 7 further comprising configuring the capacitive coupling to increase ionization potential of the plasma to at least about 25 eV.

9. The method of claim 7 further comprising configuring a torch with a first plate and a second plate to provide the capacitive coupling.

10. A method of generating a low flow plasma in a torch, the method comprising:

igniting a plasma using an argon gas flow at a first flow rate and using coupling of both inductive and capacitive coupled RF energies;

introducing a non-argon barrier gas flow into the torch; and

reducing the first flow rate to less than or equal to five liters/minute.

11. The method of claim 10 , further comprising selecting the non-argon barrier gas to be nitrogen.

12. The method of claim 10 , further comprising configuring the capacitive coupling to increase ionization potential of the plasma to at least about 25 eV.

13. The method of claim 10 , further comprising configuring the torch with a first plate and a second plate to provide the capacitive coupling.

14. The method of claim 13 , further comprising configuring the first plate to be substantially parallel to the second plate.

15. The method of claim 10 , further comprising the reducing the first flow rate to less than four liters/minute.

16. The method of claim 15 , further comprising configuring the non-argon gas flow to be about four liters/minute to about five liters/minute.

17. The method of claim 10 , further comprising selecting the non-argon barrier gas to be air.

18. The method of claim 10 , further comprising sustaining the plasma in the torch using a loop current.

19. A method of generating a plasma comprising:

igniting a plasma in a torch using an argon gas flow at a first flow rate, in which the torch comprises an inductive device and a capacitive device, the capacitive device comprising at least one plate to provide capacitive coupling that increases ionization potential of the plasma to at least about 25 eV;

introducing a non-argon barrier gas flow into the torch; and

reducing the first flow rate to a second flow rate that is less than the first flow rate.

20. The method of claim 19 , in which the inductive device comprises at least one plate electrode.

Assignments (4)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 28, 2023
From: PERKINELMER HEALTH SCIENCES INC.
To: PERKINELMER U.S. LLC
Reel/Frame 063172/0574 →
SECURITY INTEREST Recorded Mar 13, 2023
From: PERKINELMER U.S. LLC
To: OWL ROCK CAPITAL CORPORATION
Reel/Frame 066839/0109 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 13, 2012
From: PERKINELMER, INC.
To: PERKINELMER HEALTH SCIENCES, INC.
Reel/Frame 028771/0766 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 22, 2006
From: MORRISROE, PETER J.
To: PERKINELMER, INC.
Reel/Frame 017651/0260 →