IP Library Patent Application 11374164
Patent Application
App. No. 11/374,164

Insulating film, process for producing the same and electronic device using the same

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Quick Facts
Patent No.
US None
App. No.
11/374,164
Abstract

An insulating film formed by a method comprising: coating a film-forming composition containing a compound having a cage structure; and drying the coated composition, wherein the coated composition is irradiated with a light having a wavelength of 200 nm or less in at least one of during the drying and after the drying; a process for producing the same; and an electronic device having the same.

Claims (25)

1 . An insulating film formed by a method comprising:

coating a film-forming composition containing a compound having a cage structure; and

drying the coated composition,

wherein the coated composition is irradiated with a light having a wavelength of 200 nm or less in at least one of during the drying and after the drying.

2 . The insulating film according to claim 1 ,

wherein the cage structure is a saturated hydrocarbon structure.

3 . The insulating film according to claim 1 ,

wherein a ratio of all carbon atoms of the cage structure to all carbon atoms of a total solid content of the film-forming composition is 30% or more.

4 . The insulating film according to claim 1 ,

wherein the cage structure is a diamantane structure.

5 . The insulating film according to claim 4 ,

wherein the compound having a cage structure is a polymer of at least one compound represented by formula (I)

wherein R represents a hydrogen atom, an alkyl group containing from 1 to 10 carbon atoms, an alkenyl group containing from 2 to 10 carbon atoms, an alkynyl group containing from 2 to 10 carbon atoms, an aryl group containing from 6 to 20 carbon atoms or a silyl group containing from 0 to 20 carbon atoms, and when a plurality of R's exist, they may be the same or different from each other;

m represents an integer of from 1 to 14;

X represents a halogen atom, an alkyl group containing from 1 to 10 carbon atoms, an alkenyl group containing from 2 to 10 carbon atoms, an aryl group containing from 6 to 20 carbon atoms or a silyl group containing from 0 to 20 carbon atoms, and when a plurality of X's exist, they may be the same or different from each other; and

n represents an integer of from 0 to 13.

6 . The insulating film according to claim 1 ,

wherein the compound having a cage structure is a compound that does not contain a nitrogen atom.

7 . The insulating film according to claim 1 ,

wherein the film-forming composition contains an organic solvent.

8 . A process for producing an insulating film according to claim 1 , the process comprising:

a step of coating a film-forming composition containing a compound having a cage structure; and

a step of drying the coated composition,

wherein the coated composition is irradiated with a light having a wavelength of 200 nm or less in at least one of during the drying and after the drying.

9 . An electronic device comprising an insulating film according to claim 1.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 15, 2007
From: FUJIFILM HOLDINGS CORPORATION (FORMERLY FUJI PHOTO FILM CO., LTD.)
To: FUJIFILM CORPORATION
Reel/Frame 018904/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 14, 2006
From: ADEGAWA, YUTAKA
To: FUJI PHOTO FILM CO., LTD.
Reel/Frame 017686/0715 →