Positive photosensitive composition and image recording material using the same

1 . A positive photosensitive composition comprising:

(A) a compound represented by the following formula (1) which is decomposed by exposure to light to generate an acid;

(B) a high-molecular compound having a phenolic hydroxyl group; and

(C) an infrared-light absorber:

Z-Y—[R] p   General Formula (1)

p: 1˜4

wherein R represents an alkyl, cycloalkyl, aralkyl or aryl group having an acid group, Y represents a bivalent to tetravalent connecting group having at least one partial structure selected from the following group of partial structures or a terminal group selected from one of the partial structures and a terminal hydrogen atom and Z does not exist when Y is a terminal group, but represents a monovalent to tetravalent connecting group or terminal group when Y is a connecting group.

2 . The positive photosensitive composition of claim 1 , wherein the pKa of the acid group in the alkyl, cycloalkyl, aralkyl or aryl group of R in the formula (1) is 15 or less.

3 . The positive photosensitive composition of claim 2 , wherein the pKa of the acid groupin the alkyl, cycloalkyl, aralkyl or aryl group of R in the formula (1) is 13 or less.

4 . The positive photosensitive composition of claim 3 , wherein the pKa of the acid group in the alkyl, cycloalkyl, aralkyl or aryl group of R in the formula (1) is 2 to 11.

5 . The positive photosensitive composition of claim 1 , wherein the acid group in the alkyl cycloalkyl, aralkyl or aryl group of R in the formula (1) is selected from the group consisting of a phenolic hydroxyl group, a sulfonamide group, a substituted sulfonamide-based acid group, a carboxy group, a sulfonic acid group and a phosphonic acid group.

6 . The positive photosensitive composition of claim 1 , wherein the acid group in the alkyl, cycloalkyl, aralkyl or aryl group of R in the formula (1) is a functional group that can be decomposed to form an acid group.

7 . The positive photosensitive composition of claim 1 , wherein R in the formula (1) is an unsubstituted aryl group having an acid group.

8 . An image recording material comprising;

a support; and

a recording layer which is disposed on the support and comprising a specific photosensitive composition, wherein:

the photosensitive composition of the recording layer contains (A) a compound represented by the following formula (1) which is decomposed by exposure to light to generate an acid, (B) a high-molecular compound having a phenolic hydroxyl group, and (C) an infrared-light absorber;

Z-Y—[R] p   General Formula (1)

p: 1˜4

wherein R represents an alkyl, cycloalkyl, aralkyl or aryl group having an acid group, Y represents a bivalent to tetravalent connecting group having at least one partial structure selected from the following group of partial structures or a terminal group selected from one of the partial structures and a terminal hydrogen atom, and Z does not exist when Y is a terminal group, but represents a monovalent to tetravalent connecting group or terminal group when Y is a connecting group;

9 . The image recording material of claim 8 , wherein the pKa of the acid group in the alkyl cycloalkyl, aralkyl or aryl group of R in the formula (1) is 15 or less.

10 . The image recording material of claim 9 , wherein the pKa of the acid group in the alkyl, cycloalkyl, aralkyl or aryl group of R in the formula (1) is 13 or less.

11 . The image recording material of claim 10 , wherein the pKa of the acid group in the alkyl, cycloalkyl, aralkyl or aryl group of R in the formula (1) is 2 to 11.

12 . The image recording material of claim 8 , wherein the acid group in the alkyl, cycloalkyl, aralkyl or aryl group of R in the formula (1) is selected from the group consisting of a phenolic hydroxyl group, a sulfonamide group, a substituted sulfonamide-based acid group, a carboxy group, a sulfonic acid group and a phosphonic acid group.

13 . The image recording material of claim 8 , wherein the acid group in the alkyl, cycloalkyl, aralkyl or aryl group of R in the formula (1) is a functional group that can be decomposed to form an acid group.

14 . The image recording material of claim 8 , wherein R in the formula (1) is an unsubstituted aryl group having an acid group.

15 . A positive photosensitive composition comprising:

(A-1) a sulfonium salt or an iodonium salt having a compound represented by the following formula (1-1) as a counter anion,

(B) a high-molecular compound having a phenolic hydroxyl group; and

(C) an infrared-light absorber:

Z-Y—[R] p   General Formula (1-1)

p: 1˜4

wherein R represents an alkyl, cycloalkyl, aralkyl or aryl group having an anion group, Y represents a bivalent to tetravalent connecting group having at least one partial structure selected from the following group of partial structures or a terminal group selected from one of the partial structures and a terminal hydrogen atom and Z does not exist when Y is a terminal group, but represents a monovalent to tetravalent connecting group or terminal group when Y is a connecting group.

16 . The positive photosensitive composition of claim 15 , wherein the (A-1) sulfonium salt is a triaryl sulfonium salt or iodonium salt is a diaryl iodonium salt.

17 . The positive photosensitive composition of claim 15 , wherein the (A-1) sulfonium salt is represented by the following general formula (1-2):

wherein x represents the compound represented by the formula (1-1).

18 . The positive photosensitive composition of claim 15 , wherein the anion group in the general formula (1-1) is a group dissociated from a group selected from an active imide group, a sulfonic acid group and a phosphoric acid group.

19 . The positive photosensitive composition of claim 15 , wherein the (B) high-molecular compound is a novolac-based phenol resin that is mixture of phenol and cresol containing 30 to 85% by mole of a phenol as a structural unit.

20 . The positive photosensitive composition of claim 15 , wherein the (B) high-molecular compound is a novolac-based phenol resin that is mixture of phenol and cresol containing 30 to 85% by mole of phenol and 20 to 50% by mole of m-cresol as a structural unit.

21 . The positive photosensitive composition of claim 15 , further comprising an alkali-soluble resin selected from a sulfone imide-based polymer, a polymer containing a carboxyl group, and a polymer containing a sulfonamide group.

22 . A positive photosensitive composition comprising:

(A-2) a compound which is selected from a sulfonate ester, a disulfone, a sulfone imide, a diazo disulfone, a ketosulfone, and a carboxylic acid ester, and decomposed by exposure to light to generate a sulfonic acid anion represented by following formula (1-3);

(B) a high-molecular compound having a phenolic hydroxyl group; and

(C) an infrared-light absorber:

Z-Y—[R] p   General Formula (1-3)

p: 1˜4

wherein R represents an alkyl, cycloalkyl, aralkyl or aryl group having an sulfonic acid group, Y represents a bivalent to tetravalent connecting group having at least one partial structure selected from the following group of partial structures or a terminal group selected from one of the partial structures and a terminal hydrogen atom and Z does not exist when Y is a terminal group, but represents a monovalent to tetravalent connecting group or terminal group when Y is a connecting group.

23 . The positive photosensitive composition of claim 22 , further comprising an alkali-soluble resin selected from a sulfonicimide-based polymer, a polymer containing a carboxyl group, and a polymer containing a sulfonamide group.

24 . The positive photosensitive composition of claim 22 , wherein the (B) high-molecular compound is a novolac-based phenol resin that is mixture of phenol and cresol containing 30 to 85% by mole of a phenol as a structural unit.