IP Library › Granted Patent US 7,596,164
Granted Patent B2
US 7,596,164 · App. 11/376,364 · Granted Sep 29, 2009

Control system for a two chamber gas discharge laser

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Quick Facts
Patent No.
US 7,596,164
App. No.
11/376,364
Granted
Sep 29, 2009
Kind
B2
Abstract

The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include: (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F 2 injection controls with novel learning algorithm.

Claims (11)

1. A method of operating a gas discharge laser having a master oscillator potion, producing line narrowed seed laser light output pulses and a power amplifier portion, receiving and amplifying the line narrowed seed laser light output pulses into power amplifier laser light output pulses, in a burst of pulses during an on period, followed by an off period, and providing electrical discharge pulses across gas discharge electrodes in each of the master oscillator portion and power amplifier portion, comprising:

charging a first capacitor and a second capacitor in parallel to a commanded charging capacitor voltage;

timing a gas discharge in each of the master oscillator portion and the power amplifier portion as a function of the commanded charging capacitor voltage determined for an upcoming gas discharge pulse in each of the master oscillator portion and the power amplifier portion, from the first capacitor and the second capacitor, respectively;

applying correction for temperature drift based upon temperature change in an electrical discharge pulse power system providing the electrical discharge pulses; and,

applying correction for respective errors in delay of the master oscillator portion and power amplifier portion.

2. The method of claim 1 , further comprising utilizing a delay estimation function on a pre-established charging capacitor voltage set point to establish a predicted delay.

3. The method of claim 2 , further comprising utilizing a delay estimation function on a pre-established charging capacitor voltage set point for each of the master oscillator portion and the power amplifier portion to establish a respective predicted delay.

4. The method of claim 3 , further comprising comparing the actual respective measured delay for the master oscillator portion and the power amplifier portion to the respective predicted delay.

5. The method of claim 1 , further comprising utilizing a delay estimation function on a pre-established charging capacitor voltage set point for each of the master oscillator potion and the power amplifier portion to establish a respective predicted delay.

6. The method of claim 5 , further comprising comparing the actual respective measured delay for the master oscillator portion and the power amplifier portion to the respective predicted delay.

7. The method of claim 6 , further comprising measuring a respective actual delay for the master oscillator portion and for the power amplifier portion, and comparing the actual delay to the respective predicted delay, and generating a feedback control error signal to adjust the timing of the respective electrical discharge pulses.