Thin film transistor and thin film transistor display panel having a frame and a line-shaped semiconductor

1. A thin film transistor comprising:

a frame, corresponding to a single thin film transistor, formed on a substrate and having a plurality of grooves, each of the grooves extending in a direction;

a plurality of line-shaped semiconductors disposed in the grooves, each of the line-shaped semiconductors elongated from a first end to a second end along the extending directions of the grooves and separately disposed in each of the grooves;

a photosensitive pattern disposed in the grooves, the photosensitive pattern contacting the line-shaped semiconductor;

a first electrode overlapping each of the line-shaped semiconductors;

a second electrode connected to the first ends of each of the line-shaped semiconductors; and

a third electrode connected to the second ends of the line-shaped semiconductors,

wherein the grooves expose a portion of the substrate.

2. The thin film transistor of claim 1 , wherein each of the line-shaped semiconductors comprises a cylindrical core comprising single-crystal silicon, an insulating layer wrapping a cylindrical surface of the core, and a conductive layer surrounding the insulating layer.

3. The thin film transistor of claim 2 ,

wherein end portions of the core are exposed, and

wherein the second and third electrodes contact the exposed end portions of the core.

4. The thin film transistor of claim 1 , wherein a height of the grooves is 2 μm or less.

5. The thin film transistor of claim 1 , wherein an interval between adjacent grooves is in a range of about 2 μm to about 4 μm.

6. The thin film transistor of claim 1 , wherein the grooves extend substantially parallel to each other.

7. A thin film transistor display panel comprising:

a substrate; and

a plurality of thin film transistors disposed on the substrate, each of the plurality of thin film transistors comprising:

a frame formed on the substrate and having a plurality of grooves;

a plurality of line-shaped semiconductors disposed in the grooves, each of the line-shaped semiconductors elongated from a first end to a second end along a longitudinal direction of the grooves and separately disposed in each of the grooves;

a photosensitive pattern disposed in the grooves, the photosensitive pattern contacting the line-shaped semiconductor;

a gate line overlapping the line-shaped semiconductors;

a data line connected to the first ends of the line-shaped semiconductors;

a drain electrode connected to the second ends of the line-shaped semiconductors; and

a pixel electrode connected to the drain electrode,

wherein the grooves expose a portion of the substrate.

8. The thin film transistor display panel of claim 7 , wherein each of the line-shaped semiconductors comprises a cylindrical core comprising single-crystal silicon, an insulating layer wrapping a cylindrical surface of the core, and a conductive layer surrounding the insulating layer.

9. The thin film transistor display panel of claim 8 , wherein end portions of the core are exposed, and

wherein the data line and the drain electrode are in contact with the exposed portions of the core.

10. The thin film transistor display panel of claim 7 , wherein the frame comprises a transparent organic material.

11. The thin film transistor display panel of claim 7 , wherein a height of the grooves is 2 μm or less.

12. The thin film transistor display panel of claim 7 , wherein an interval between adjacent grooves is in a range of 2 μm to 4 μm.

13. The thin film transistor display panel of claim 7 , wherein a planar side of the frame is about 4 μm to about 10 μm.

14. The thin film transistor display panel of claim 7 , wherein the grooves extend substantially parallel to each other.