Super-phobic surface structures
View Patent ↗Superlyophobic Surface Structure, including a substrate having a surface; a plurality of nanoscale raised features on the substrate surface, each nanoscale raised feature having a length measured in a direction approximately perpendicular to the substrate surface, each nanoscale raised feature having a raised feature diameter along the length and measured in a direction approximately parallel to the substrate surface; a nanoscale top feature on each of a plurality of the nanoscale raised features, each nanoscale top feature having a top feature diameter measured in a direction approximately parallel to the substrate surface; in which an average top feature diameter is greater than an average raised feature diameter. Method of fabricating a Superlyophobic Surface Structure.
1. A structure, comprising:
a substrate having a substrate surface;
a plurality of spaced-apart nanoscale top features collectively forming a superlyophobic surface over the substrate, each nanoscale top feature having a diameter measured in a direction approximately parallel with the substrate surface; and
a plurality of nanoscale raised features on the substrate surface, each of the nanoscale raised features supporting one of the nanoscale top features over the substrate, each of the nanoscale raised features having a length measured in a direction approximately perpendicular to the substrate surface, and each of the nanoscale raised features having a diameter along the length and measured in a direction approximately parallel with the substrate surface;
wherein at a first point along the length of each of the nanoscale raised features and being located near the substrate surface, the diameter of the nanoscale raised feature is greater than at a second point, the second point being spaced apart from the first point along the length of the nanoscale raised feature and being located near the supported nanoscale top feature; and
wherein an average diameter of the nanoscale top features is greater than an average diameter of the nanoscale raised features at the second point.
2. The structure of claim 1 , wherein the length of each nanoscale raised feature is within a range of between about 5 micrometers and about 20 micrometers.
3. The structure of claim 1 , wherein the average diameter of the nanoscale raised features is within a range of between about 100 nanometers and about 1000 nanometers.
4. The structure of claim 1 , wherein each nanoscale top feature has a height measured in a direction approximately perpendicular to the substrate surface, and an average height of the nanoscale top features is within a range of between about 50 Angstroms and about 1000 Angstroms.
5. The structure of claim 1 , wherein the average diameter of the nanoscale top features is within a range of between about 100 nanometers and about 1000 nanometers.
6. The structure of claim 1 , wherein an aspect ratio is defined as the diameter of a nanoscale raised feature at the first point wherein the first point is located about one micrometer away from the substrate surface, divided by the diameter of the nanoscale raised feature at the second point wherein the second point is located about one micrometer away from the nanoscale top feature, and the aspect ratio is at least about 2:1.
7. The structure of claim 1 , wherein each of the nanoscale raised features includes a post on the substrate.
8. The structure of claim 1 , wherein each of the nanoscale top features includes a disk.
9. The structure of claim 1 , wherein each of the nanoscale raised features is tapered between the first and second points.
10. The structure of claim 1 , wherein an average diameter of the nanoscale top features is greater than an average diameter of the nanoscale raised features.