Substrate with transparent conductive oxide film, process for its production and photoelectric conversion element
A substrate with a transparent conductive oxide film (especially a substrate with a transparent conductive oxide film useful as a substrate for a thin-film silicon-based solar cell) being excellent in mass production efficiency and being characterized by having a low resistance, a high transparency and a good light scattering performance over a full wavelength region (300 nm to 3 μm) of solar ray, a process for its production, and a photoelectric-conversion element (especially, solar cell) employing the substrate, are presented. A substrate with a transparent conductive oxide film, comprising a substrate and a transparent conductive oxide layer formed on the substrate and constituted by a plurality of ridges and a plurality of flat portions, wherein the surfaces of the ridges and the flat portions, have many continuous micron-size protrusions.
1. A substrate with a transparent conductive oxide film, comprising a substrate having a smooth surface and a transparent conductive oxide film provided on the substrate,
wherein the transparent conductive oxide film comprises a plurality of discontinuous ridges made of a first oxide having a refractive index of from 1.8 to 2.2 in the wavelength range of from 400 to 800 nm and a continuous layer made of a second oxide of different composition than the first oxide and formed over the discontinuous ridges and between the discontinuous ridges, said continuous layer having a continuous series of micron-size protrusions over each of the discontinuous ridges and between each of the discontinuous ridges.
2. A substrate with a transparent conductive oxide film, comprising a substrate having a smooth surface and a transparent conductive oxide film provided on the substrate and comprising a plurality of discontinuous ridges made of a first oxide and a continuous layer made of a second oxide of different composition than the first oxide formed on the plurality of discontinuous ridges of the first oxide,
wherein a surface of the continuous layer over each of the discontinuous ridges and between each of the discontinuous ridges has a plurality of continuous micron-size protrusions.
3. A substrate with a transparent conductive oxide film, comprising a substrate having a smooth surface and a transparent conductive oxide film provided on the substrate,
wherein the transparent conductive oxide film comprises a plurality of discontinuous ridges made of a first oxide having a refractive index of from 1.8 to 2.2 in the wavelength range of from 400 to 800 nm and a continuous layer made of a second oxide of different composition than the first oxide formed on the ridges,
wherein the transparent conductive oxide film further includes a film made of an oxide different than the first and second oxides and formed between the plurality of discontinuous ridges made of the first oxide and the continuous layer made of the second oxide.
4. A substrate with a transparent conductive oxide film, comprising a substrate having a smooth surface and a transparent conductive oxide film provided on the substrate,
wherein the transparent conductive oxide film comprises a plurality of discontinuous ridges made of a first oxide and a continuous layer made of a second oxide of different composition than the first oxide formed over the discontinuous ridges and between the discontinuous ridges, and total coverage of the discontinuous ridges on the substrate is from 10 to 70% of the substrate surface area,
wherein the continuous layer has a plurality of continuous micron-size protrusions over each of the discontinuous ridges and between each of the discontinuous ridges.