Method of fabricating organic light emitting device
Methods of fabricating an organic light emitting device using plasma and/or thermal decomposition are provided. An insulating layer is formed by reacting first and second radicals. The first radical is formed by passing a first gas through a plasma generating region and a heating body, and the second radical is formed by passing a second gas through the heating body. The methods improve the characteristics of the resulting insulating layer and increase the use efficiency of the source gas by substantially decomposing the source gas. The insulating layer can be a passivation layer formed on an organic light emitting device. The methods use plasma apparatuses such as an inductively coupled plasma chemical vapor deposition (ICP-CVD) apparatuses or plasma enhanced chemical vapor deposition (PECVD) apparatuses.
1. A method of fabricating an organic light emitting device, comprising:
preparing a substrate comprising:
a first electrode,
an organic layer comprising at least an emission layer, and
a second electrode;
placing the substrate in a chamber;
preparing a plasma in a cavity of a showerhead in communication with the chamber by injecting an inert gas into a plasma generation region in the cavity and applying power to the cavity;
passing a first gas through the plasma;
passing the first gas by a heating filament positioned between the showerhead and the substrate, wherein passing the first gas through the plasma and by the heating filament forms a first radical;
passing a second gas by the heating filament positioned between the showerhead and the substrate without passing the second gas through the plasma, wherein passing the second gas by the heating filament forms a second radical; and
reacting the first and second radicals to form an insulating layer on the second electrode.
2. The method according to claim 1 , wherein the insulating layer is a passivation layer.
3. The method according to claim 1 , wherein the first gas first passes through the plasma, and then passes by the heating filament, thereby forming the first radical.
4. The method according to claim 1 , wherein the cavity and the heating filament are contained in the chamber, the substrate being loaded in the chamber and the first and second gases are supplied to the chamber.
5. The method according to claim 1 , wherein the showerhead is in the chamber.
6. The method according to claim 1 , wherein the first gas requires an energy for decomposition higher than an energy for decomposition required by the second gas.
7. The method according to claim 1 , wherein the first gas is selected from the group consisting of ammonia gas and nitrogen gas.
8. The method according to claim 1 , wherein the second gas comprises silane gas.
9. The method according to claim 1 , wherein the heating filament comprises tungsten.
10. The method according to claim 1 , wherein the insulating layer comprises a silicon nitride layer.
11. The method according to claim 1 , wherein the heating filament is heated to a temperature of at least about 1000° C.
12. The method according to claim 1 , wherein the heating filament is heated to a temperature of about 1500° C. or greater.
13. A method of fabricating an organic light emitting device, comprising:
preparing a substrate comprising:
a first electrode,
an organic layer comprising at least an emission layer, and
a second electrode;
placing the substrate in a chamber;
preparing a plasma in a cavity of a showerhead in communication with the chamber by injecting an inert gas into a plasma generation region in the cavity and applying power to the cavity;
passing a first gas through the plasma to decompose the first gas and then passing the first gas by a heating filament positioned between the showerhead and the substrate and heated to a temperature of at least about 1000° C. to further decompose the first gas, wherein the decomposed first gas forms a first radical;
passing a second gas by the heating filament positioned between the showerhead and the substrate without passing the second gas through the plasma to decompose the second gas, wherein the decomposed second gas forms a second radical; and
reacting the first and second radicals to form an insulating layer on the second electrode.
14. The method according to claim 13 , wherein the cavity and the heating filament are contained in the chamber, the substrate being loaded in the chamber and the first and second gases are supplied to the chamber.
15. The method according to claim 13 , wherein the showerhead is in the chamber.
16. The method according to claim 13 , wherein the first gas requires an energy for decomposition higher than an energy for decomposition required by the second gas.
17. The method according to claim 13 , wherein the heating filament is heated to a temperature of about 1500° C. or greater.