Organic light emitting device
Organic light emitting devices are provided. One organic light emitting device includes a buffer layer including a fullerene-based material and a hole injection layer and/or a hole transport layer doped with the fullerene-based material.
1. An organic light emitting device comprising:
a substrate;
an anode formed on the substrate;
a buffer layer formed on the anode and comprising a fullerene-based material;
an organic emission layer formed on the buffer layer; and
a cathode formed on the organic layer.
2. The device according to claim 1 , wherein the fullerene-based material is selected from the group consisting of C60, C70, C76, C78, C82, C84, C90, C94, and C96.
3. The device according to claim 1 , wherein the buffer layer has a thickness ranging from about 1 to about 5 nm.
4. The device according to claim 3 , wherein the buffer layer has a thickness of about 5 nm.
5. The device according to claim 1 , wherein the buffer layer is formed by vacuum deposition.
6. An organic light emitting device comprising:
a substrate;
an anode formed on the substrate;
a buffer layer formed on the anode and comprising a fullerene-based material;
at least one first layer selected from the group consisting of hole injection layers, hole transport layers and combinations thereof, wherein the hole injection layers and hole transport layers are doped with the fullerene-based material of the buffer layer and are formed on the buffer layer;
an organic emission layer formed on the at least one first layer; and
a cathode formed on the organic emission layer.
7. The device according to claim 6 , wherein the fullerene-based material is selected from the group consisting of C60, C70, C76, C78, C82, C84, C90, C94, and C96.
8. The device according to claim 6 , wherein the buffer layer has a thickness ranging from about 1 to about 5 nm.
9. The device according to claim 8 , wherein the buffer layer has a thickness of about 5 nm.
10. The device according to claim 6 , wherein the buffer layer is formed by vacuum deposition.
11. The device according to 6 , wherein the hole injection layer comprises a material selected from the group consisting of CuPc, TNATA, TCTA, TDAPB, TDATA, PANI, and PEDOT.
12. The device according to claim 11 , wherein the fullerene-based material is present in the hole injection layer at a concentration ranging from 1 to 30 wt % based on the total weight of the hole injection layer.
13. The device according to claim 6 , wherein the hole transport layer comprises a material selected from the group consisting of NPD, TPD, s-TAD, MTDATA, and PVK.
14. The device according to claim 13 , wherein the fullerene-based material is present in the hole transport layer at a concentration of about 2 wt % or less based on the total weight of the hole transport layer.
15. The device according to claim 14 , wherein the fullerene-based material is present in the hole transport layer at a concentration of about 2 wt %.
16. The device according to claim 6 , wherein the hole transport layer comprises a material having a lowest unoccupied molecular orbital (LUMO) that is lower in energy than a LUMO of the fullerene-based material.
17. The device according to claim 6 , wherein the at least one layer is doped with the fullerene-based material using a method selected from the group consisting of vacuum deposition, spin coating, and ink-jet printing.
18. The device according to claim 6 , wherein the at least one layer comprises multiple layers.
19. The device according to claim 6 , further comprising at least one second layer selected from the group consisting of hole blocking layers, electron transport layers, and electron injection layers, wherein the at least one second layer is deposited on the organic emission layer.
20. An organic light emitting device comprising:
a substrate;
an anode formed on the substrate;
a buffer layer formed on the anode and comprising a fullerene-based material;
at least one first layer selected from the group consisting of hole injection layers, hole transport layers and combinations thereof, wherein the hole injection layers and hole transport layers are doped with the fullerene-based material of the buffer layer and are formed on the buffer layer;
an organic emission layer formed on the at least one first layer;
at least one second layer selected from the group consisting of hole blocking layers, electron transport layers, electron injection layers and combinations thereof, wherein the at least one second layer is formed on the organic emission layer; and
a cathode formed on the at least one second layer.