IP Library Granted Patent US 7,326,958
Granted Patent B2
US 7,326,958 · App. 11/406,288 · Granted Feb 5, 2008

Solid state imaging device

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Quick Facts
Patent No.
US 7,326,958
App. No.
11/406,288
Granted
Feb 5, 2008
Kind
B2
Abstract

A solid state imaging device includes: a plurality of photoelectric conversion elements which are arranged in a two-dimensional matrix on a semiconductor chip; vertical transfer registers including a vertical transfer channel and vertical transfer electrodes, respectively, for transferring signal charge read out of the photoelectric conversion elements in the vertical direction; a horizontal transfer register including a horizontal transfer channel and horizontal transfer electrodes for transferring the signal charge transferred from the vertical transfer registers in the horizontal direction; bus interconnects which are electrically connected to the vertical transfer electrodes and the horizontal transfer electrodes; and pads for external connection which are electrically connected to the bus interconnects. The pads are formed above the bus interconnects and the horizontal transfer electrodes.

Claims (19)

1. A solid state imaging device comprising:

a plurality of photoelectric conversion elements which are arranged in a two-dimensional matrix on a semiconductor chip;

vertical transfer registers including a vertical transfer channel and vertical transfer electrodes, respectively, for transferring signal charge read out of the photoelectric conversion elements in the vertical direction;

a horizontal transfer register including a horizontal transfer channel and horizontal transfer electrodes for transferring the signal charge transferred from the vertical transfer registers in the horizontal direction;

bus interconnects which are electrically connected to the vertical transfer electrodes and the horizontal transfer electrodes; and

pads for external connection which are electrically connected to the bus interconnects, wherein

the pads are formed above the bus interconnects and the horizontal transfer electrodes.

2. The solid state imaging device according to claim 1 , wherein

the pads are located above the horizontal transfer channel.

3. The solid state imaging device according to claim 2 , wherein

the horizontal transfer electrodes are conductive layers and the pads are metal layers.

4. The solid state imaging device according to claim 3 , wherein

the conductive layers are made of polysilicon.

5. The solid state imaging device according to claim 1 , wherein

the pads are inclined from the main surface of the semiconductor chip.

6. The solid state imaging device according to claim 1 , wherein

the pads are electrically connected to the bus interconnects via contact plugs.

7. The solid state imaging device according to claim 1 , wherein

the photoelectric conversion elements, vertical transfer registers and horizontal transfer register provide a CCD image sensor.

Assignments (4)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 26, 2014
From: PANASONIC CORPORATION
To: COLLABO INNOVATIONS, INC.
Reel/Frame 033021/0806 →
LIEN Recorded Jan 13, 2014
From: COLLABO INNOVATIONS, INC.
To: PANASONIC CORPORATION
Reel/Frame 031997/0445 →
CHANGE OF NAME Recorded Jan 8, 2014
From: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
To: PANASONIC CORPORATION
Reel/Frame 031947/0358 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 6, 2006
From: MATSUDA, YUJI
To: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
Reel/Frame 018212/0039 →