Method for producing phosphor panels
A phosphor panel producing method forms a phosphor layer by vacuum film deposition, estimates a thickness profile of the phosphor layer and polishes a surface of the phosphor layer by means of a polishing member as it is pressed with a pressing member that extends in a one-dimensional direction in such a way that a direction in which a thickness profile of the phosphor layer is more uniform coincides with the one-dimensional direction in which the pressing member extends, and the phosphor layer and the polishing member is moved relative to each other in a direction perpendicular to the one-dimensional direction in which the pressing member extends.
1 . A method for producing a phosphor panel, comprising the steps of:
forming a phosphor layer by vacuum film deposition;
estimating a thickness profile of the phosphor layer; and
polishing a surface of the phosphor layer by means of a polishing member as it is pressed with a pressing member that extends in a one-dimensional direction in such a way that a direction in which a thickness profile of the phosphor layer is more uniform coincides with the one-dimensional direction in which the pressing member extends, and the phosphor layer and the polishing member being moved relative to each other in a direction perpendicular to the one-dimensional direction in which the pressing member extends.
2 . The method for producing a phosphor panel according to claim 1 , further comprising the step of: sealing the phosphor layer whose surface has been polished with a moisture-proof protective layer.
3 . The method for producing a phosphor panel according to claim 1 , wherein the phosphor layer is formed of a stimulable phosphor.
4 . The method for producing a phosphor panel according to claim 1 , wherein the phosphor layer is formed of CsBr:Eu.
5 . A method for producing a phosphor panel comprising the steps of:
forming a phosphor layer by vacuum film deposition; and
polishing a surface of the phosphor layer repeatedly by means of a polishing member in changed polishing positions on the phosphor layer, with the phosphor layer and the polishing member being moved relative to each other at a distance of from 50 μm to 400 μm.
6 . The method for producing a,phosphor panel according to claim 5 , further comprising the step of:
estimating a thickness profile of the phosphor layer;
wherein the surface of the phosphor layer is polished by means of the polishing member as it is pressed with a pressing member that extends in a one-dimensional direction in such a way that a direction in which the thickness profile of the phosphor layer is more uniform coincides with the one-dimensional direction in which the pressing member extends, and the phosphor layer and the polishing member being moved relative to each other at the distance of from 50 μm to 400 μm in a direction perpendicular to the one-dimensional direction in which the pressing member extends.
7 . The method for producing a phosphor panel according to claim 5 , wherein the distance at which the phosphor layer and the polishing member are moved relative to each other is between 100 μm and 300 μm.
8 . The method for producing a phosphor panel according to claim 5 , wherein the phosphor layer whose surface has been polished is sealed with a moisture-proof protective layer.
9 . The method for producing a phosphor panel according to claim 5 , the phosphor layer is formed of a stimulable phosphor.
10 . The method for producing a phosphor panel according to claim 5 , the phosphor layer is formed of CsBr:Eu.