Method of treating a gas stream
View Patent ↗A method is described of treating a gas stream exhausted from an atomic layer deposition (ALD) process chamber to which two or more gaseous precursors are alternately supplied. Between the process chamber and a vacuum pump used to draw the gas stream from the chamber, the gas stream is conveyed to a gas mixing chamber, to which a reactant is supplied for reacting with one of the gaseous precursors to form solid material. The gas stream is then conveyed to a cyclone separator to separate solid material from the gas stream. By deliberately reacting a non-reacted precursor to form solid material upstream from the pump, reaction within the pump of the non-reacted precursor and a second non-reacted precursor subsequently drawn from the chamber by the pump can be inhibited.
1. A method of treating an exhaust gas stream from a process chamber to which a first precursor gas and a second precursor gas are alternately supplied, the method comprising:
conveying the gas stream to a gas mixing chamber;
heating a reactant prior to supplying the reactant to the gas mixing chamber;
supplying the reactant to the gas mixing chamber;
reacting the reactant with one of the first precursor gas or the second precursor gas to form solid material;
conveying the gas stream to a separator; and
separating the solid material from the gas stream;
wherein the gas mixing chamber is upstream of a vacuum pump used to draw the gas stream from the process chamber and wherein the reactant is the same as the second precursor gas and the reactant reacts with the first precursor gas.
2. The method according to claim 1 , further comprising heating at least one of the gas mixing chamber or the separator.
3. The method according to claim 1 , wherein the gas mixing chamber is integral with the separator.
4. The method according to claim 1 , wherein the reactant is an oxidant.
5. The method according to claim 4 , wherein the reactant is ozone.
6. The method according to claim 1 , wherein the first precursor gas or the second precursor gas is an organometallic precursor.
7. The method according to claim 6 , wherein the organometallic precursor is hafnium or aluminium.
8. The method according to claim 1 , wherein the separator is a cyclone separator.
9. A method of treating an exhaust gas stream from a process chamber to which a first precursor gas and a second precursor gas are alternatively supplied, comprising:
adding a reactant to the gas stream in a gas mixing chamber;
heating the reactant prior to adding the reactant to the gas stream in the gas mixing chamber
reacting the reactant with one of the first precursor gas or the second precursor gas to form a solid material;
conveying the gas stream to a separator; and
separating the solid material from the gas stream;
wherein the reactant is the same as the second precursor gas and the reactant reacts with the first precursor gas.