Method for significant reduction of dislocations for a very high A1 composition A1GaN layer
View Patent ↗A method for reducing dislocation density between an AlGaN layer and a sapphire substrate involving the step of forming a self-organizing porous AlN layer of non-coalescing column-like islands with flat tops on the substrate.
1. A method for reduction of dislocation density in an AlGaN semiconductor comprising the steps of:
preparing a sapphire substrate for epitaxial layer growth,
growing a self-organized porous AlN buffer layer on said substrate,
the AlN layer exhibiting non-coalescing column-like islands with flat tops, and growing an AlGaN layer directly on said AlN layer,
wherein there are neither any intermediate layers between the substrate and the AlN layer nor any intermediate layers between the AlN and the AlGaN layer.
2. A method as recited in claim 1 wherein in-situ pattering processes on said substrate are not implemented.
3. A method as recited in claim 1 wherein said AlGaN layer contains up to 7% Ga.
4. A method as recited in claim 1 wherein said AlN layer is formed at least in part by use of transmission electron microscopy.
5. A method as recited in claim 1 wherein said AlN layer is formed at least in part by use of atomic force microscopy.
6. A method as recited in claim 1 wherein said AlN layer is formed at least in part by use of x-ray diffraction.
7. A method as recited in claim 1 wherein said AlN layer is formed by use of a combination of atomic force microscopy, x-ray diffraction and transmission electron microscopy in order to achieve an AlN layer that lacks both overgrowth and an in-situ pattering process.
8. A method as recited in claim 7 wherein all the layers are grown at a temperature over 900° C.