Alkaline developer for radiation sensitive compositions
The invention relates to an alkaline developer for irradiated radiation sensitive compositions, which developer is based on water, comprises at least one alkaline reacting silicate and has a pH of at least 11, characterized in that the developer comprises at least a non-ionic surfactant, wherein the hydrophobic part is an aryl group having in addition to the hydrophilic part at least two substituents different to hydrogen, and the hydrophilic part is a polyethyleneoxy group with at least 6 ethyleneoxy units. The developer leads to less depositions in the developing apparatus and on the processed printing plates and has an increased sedimentation stability.
1 . An alkaline developer for irradiated radiation sensitive compositions, which developer is based on water and comprises at least one alkaline reacting silicate, characterized in that the developer has a pH of at least 11 and comprises at least a surfactant of formula (I):
R 1 —R 2 (I),
wherein
R 1 represents a hydrophobic aryl group having in addition to R 2 at least two substituents different to hydrogen,
R 2 represents a hydrophilic group comprising a polyethyleneoxy group with at least 6 ethyleneoxy units, and
wherein the concentration of the silicate is at least 0.2 weight-% and that of the surfactant of formula (I) at least 0.05 weight-%, in each case based on the total weight of the developer.
2 . An alkaline developer according to claim 1 , wherein R 1 is selected such that R 1 —H has a water solubility of less then 0.5 g/L at 16° C., and R 2 is selected such that R 2 —H has a water solubility of at least 10 g/L at 20° C.
3 . An alkaline developer according to claim 1 , wherein R 2 is selected such that R 2 —H is an aliphatic group and is indefinitely soluble in water at 20° C.
4 . An alkaline developer according to claim 2 , wherein R 2 is selected such that R 2 —H is an aliphatic group and is indefinitely soluble in water at 20° C.
5 . An alkaline developer according to claim 1 , wherein R 1 represents a phenyl group, that has besides R 2 two or three substituents.
6 . An alkaline developer according to claim 1 , wherein the surfactant of formula (I) is of formula (Ia):
wherein
R 2 has the same meaning as given in claim 1 ,
R 3 represents a 1,1-phenylethyl or a t-butyl group, and
n means 2 or 3.
7 . An alkaline developer according to claim 1 , wherein the surfactant of formula (I) is of formula (Ib):
wherein
R 1 has the same meaning as given in claim 1 , and
n is an integer of at least 6.
8 . An alkaline developer according to claim 7 , wherein n is an integer from 8 to 50.
9 . An alkaline developer according to claim 1 , wherein the developer comprises at least an additional surfactant having a structure different to the surfactant of formula (I).
10 . An alkaline developer according to claim 6 , wherein the developer comprises at least an additional surfactant having a structure different to the surfactant of formula (Ia).
11 . An alkaline developer according to claim 7 , wherein the developer comprises at least an additional surfactant having a structure different to the surfactant of formula (Ib).
12 . An alkaline developer according to claim 9 , wherein the additional surfactant is of formula (IIa):
wherein
R 4 represents H, a substituted or unsubstituted alkyl group having at least 1 carbon atom, or a monosubstituted or unsubstituted aryl group having at least 6 carbon atoms,
R 5 mutually independently represents a polyoxyalkylene group, and
p represents an integer of at least 1.
13 . An alkaline developer according to claim 10 , wherein the additional surfactant is of formula (IIa):
wherein
R 4 represents H, a substituted or unsubstituted alkyl group having at least 1 carbon atom, or a monosubstituted or unsubstituted aryl group having at least 6 carbon atoms,
R 5 mutually independently represents a polyoxyalkylene group, and
p represents an integer of at least 1.
14 . An alkaline developer according to claim 11 , wherein the additional surfactant is of formula (IIa):
wherein
R 4 represents H, a substituted or unsubstituted alkyl group having at least 1 carbon atom, or a monosubstituted or unsubstituted aryl group having at least 6 carbon atoms,
R 5 mutually independently represents a polyoxyalkylene group, and
p represents an integer of at least 1.
15 . An alkaline developer according to claim 9 , wherein the additional surfactant is of formula (IIb), (IIc) or (IId):
wherein R 6 to R 13 mutually independently consist of polyoxyethylene and polyoxypropylene groups.
16 . An alkaline developer according to claim 10 , wherein the additional surfactant is of formula (IIb), (IIc) or (IId):
wherein R 6 to R 13 mutually independently consist of polyoxyethylene and polyoxypropylene groups
17 . An alkaline developer according to claim 11 , wherein the additional surfactant is of formula (IIb), (IIc) or (IId):
wherein R 6 to R 13 mutually independently consist of polyoxyethylene and polyoxypropylene groups
18 . An alkaline developer according to claim 15 , wherein R 6 to R 13 mutually independently represent -Z 1 -Z 2 -H, -Z 2 -Z 1 -H, -Z 1 -Z 2 -Z 1 -H and/or -Z 2 -Z 1 -Z 2 -H,
wherein
Z 1 represents —O—(—CH 2 —CH 2 —O—) x —,
Z 2 represents —O—(—CH 2 —CH(CH3)—O—) y —, and wherein x, y mutually independently are integers from 3 to 200.
19 . An alkaline developer according to claim 16 , wherein R 6 to R 13 mutually independently represent -Z 1 -Z 2 -H, -Z 2 -Z 1 -H, -Z 1 -Z 2 -Z 1 -H and/or -Z 2 -Z 1 -Z 2 -H,
wherein
Z 1 represents —O—(—CH 2 —CH 2 —O—) x —,
Z 2 represents —O—(—CH 2 —CH(CH3)—O—) y —, and wherein x, y mutually independently are integers from 3 to 200.
20 . An alkaline developer according to claim 17 , wherein R 6 to R 13 mutually independently represent -Z 1 -Z 2 -H, -Z 2 -Z 1 -H, -Z 1 -Z 2 -Z 1 -H and/or -Z 2 -Z 1 -Z 2 -H,
wherein
Z 1 represents —O—(—CH 2 —CH 2 —O—) x —,
Z 2 represents —O—(—CH 2 —CH(CH3)—O—) y —, and wherein x, y mutually independently are integers from 3 to 200.
21 . An alkaline developer according to claim 18 , wherein the Z 2 block(s) of the additional surfactant have in total a molecular weight of at least 2000 g/mol, and the surfactant of formula (IIb), (IIc) or (IId) comprises 25 to 55 weight-% Z 1 blocks based on the total molecular weight of the Z 1 blocks and the Z 2 blocks in the molecule.
22 . An alkaline developer according to claim 19 , wherein the Z 2 block(s) of the additional surfactant have in total a molecular weight of at least 2000 g/mol, and the surfactant of formula (IIb), (IIc) or (IId) comprises 25 to 55 weight-% Z 1 blocks based on the total molecular weight of the Z 1 blocks and the Z 2 blocks in the molecule.
23 . An alkaline developer according to claim 20 , wherein the Z 2 block(s) of the additional surfactant have in total a molecular weight of at least 2000 g/mol, and the surfactant of formula (IIb), (IIc) or (IId) comprises 25 to 55 weight-% Z 1 blocks based on the total molecular weight of the Z 1 blocks and the Z 2 blocks in the molecule.
24 . An alkaline developer according to claim 9 , wherein the ratio by weight of the surfactant of formula (I) to the additional surfactant is from 1:1 to 1:80.
25 . An alkaline developer according to claim 10 , wherein the ratio by weight of the surfactant of formula (I) to the additional surfactant is from 1:1 to 1:80.
26 . An alkaline developer according to claim 11 , wherein the ratio by weight of the surfactant of formula (I) to the additional surfactant is from 1:1 to 1:80.
27 . A method of making a lithographic printing plate comprising the steps of imagewise exposing a lithographic printing plate precursor and processing it in an alkaline developer according to any of the preceding claims.