Controlled zone microwave plasma system

1. A microwave plasma system, comprising:

an applicator providing microwaves having at least one wavelength;

a process gas in the microwaves;

at least one electrically conductive plate located in the microwaves, with each conductive plate having a plurality of tapered electrically conductive fingers that are electrically interconnected, each conductive finger having a tip that is adjacent to and disconnected from tips of adjacent conductive fingers, wherein arcing occurs between adjacent disconnected tips in the presence of the process gas and the microwaves, and wherein a process gas plasma is initiated;

and wherein the plurality of tapered conductive fingers are formed as tapered projections, each projection having two sides forming a base and narrowing to form at least portions of the tip, wherein the bases are arranged in an array having a centroid and the tips converge toward the centroid to form an aperture that opens to an array of tapered spacings extending between the sides of the adjacent conductive fingers, the spacings widening from the tips of adjacent conductive fingers to the bases of the adjacent conductive fingers.

2. The microwave plasma system of claim 1 wherein,

each finger has a length no less than approximately one fourth the shortest wavelength and wherein the conductive fingers form a closed array having an aperture.

3. The microwave plasma system of claim 1 further comprising a transport mechanism for conveying process material through at least a portion of the process gas plasma for a residence time.

4. The microwave plasma system of claim 3 wherein,

the microwaves have a wavelength of approximately four and three fourth inches (one hundred twenty one millimeters),

the conductive fingers have a length no less than approximately one inch (twenty five millimeters).

5. The microwave plasma system of claim 1 wherein the at least one conductive plate comprises:

a plurality of conductive plates axially aligned in the microwaves, with each conductive plate having a plurality of conductive fingers, each finger having a length no less than approximately one fourth the shortest wavelength and wherein the conductive fingers form a closed array having an aperture, the conductive fingers being configured to initiate a process gas plasma in the presence of the microwaves and the process gas.

6. The microwave plasma system of claim 5 further comprising a transport mechanism for conveying process material through at least a portion of the process gas plasma for a residence time.

7. The microwave plasma system of claim 5 further comprising a process material rate controller.

8. The microwave plasma system of claim 1 wherein the at least one conductive plate comprises:

a conductive plate located in the applicator, the conductive plate having a plurality of conductive fingers, each finger having a length and a tip and a post having a surface, where the length of each finger is no less than approximately one fourth the shortest microwave wavelength and where for every finger the distance between the tip of the finger and the closest tip of another finger is less than the distance between any other point on the surface of the post of the finger and any position on the surface of the post of another finger, the conductive fingers being configured and positioned to initiate a process gas plasma in the presence of the microwaves and the process gas.

9. The microwave plasma system of claim 8 further comprising a transport mechanism for conveying process material through at least a portion of the process gas plasma for a residence time.

10. The microwave plasma system of claim 8 wherein at least a portion of the conductive fingers form at least one substantially linear array.