Method of passivating semiconductor device
View Patent ↗In a method of passivating a semiconductor device with two types of transistors, e.g., NMOS and PMOS transistor, the semiconductor device is placed in a pressurized sealed chamber and at least two different passivating gases are introduced into the chamber. The two passivating gases can be selected to have one gas suitable for passivating PMOS transistors and the other gas suitable for NMOS transistors.
1. A method of passivating a semiconductor device having first transistors of a first type and second transistors of a second type different from the first type, said method comprising:
placing the semiconductor device in a chamber; and
passivating the first and second transistors with first and second passivating gases, respectively;
wherein said passivating comprises
simultaneously introducing the first and second passivating gases into the chamber wherein one of the first and second passivating gases is H 2 O; and
heating the semiconductor device at a predetermined temperature for a predetermined period sufficient for the first and second passivating gases to respectively passivate the first and second transistors, whereby dangling bonds within the semiconductor device are repaired.
2. The method as claimed in claim 1 , wherein the first and second passivating gases are different gases.
3. The method as claimed in claim 1 , wherein the first transistors are PMOS transistors and the first passivating gas is N 2 , whereas the second transistors are NMOS transistors and the second passivating gas is H 2 O.
4. The method as claimed in claim 1 , wherein the first transistors are PMOS transistors and the first passivating gas is H 2 , whereas the second transistors are NMOS transistors and the second passivating gas is H 2 O.
5. A method of passivating a semiconductor device, said method comprising:
placing a semiconductor device in a chamber, the semiconductor device having a first type of transistors and a second type of transistors;
simultaneously introducing a first passivating gas and a second passivating gas into the chamber, wherein the first passivating gas and the second passivating gas are respectively adapted to passivate the first type of transistors and the second type of transistors, and one of the first and second passivating gases is H 2 O, whereby dangling bonds within the semiconductor device are repaired; and
heating the semiconductor device at a temperature for a period sufficient to passivate the semiconductor device.
6. The method as claimed in claim 5 , wherein the first type of transistors are PMOS transistors and the first passivating gas is N 2 , and the second type of transistors are NMOS transistors and the second passivating gas is H 2 O.
7. The method as claimed in claim 5 , wherein the first type of transistors are PMOS transistors and the first passivating gas is H 2 , and the second type of transistors are NMOS transistors and the second passivating gas is H 2 O.
8. The method as claimed in claim 5 , wherein the first passivating gas is H 2 or N 2 .
9. The method as claimed in claim 5 , wherein the first type of transistors are PMOS transistors and the second type of transistors are NMOS transistors.
10. The method as claimed in claim 5 , wherein the semiconductor device comprises a CMOS circuit of an active matrix display device.
11. The method as claimed in claim 5 , wherein the chamber maintains a pressure between 5 atmospheres and 20 atmospheres.
12. The method as claimed in claim 5 , wherein the first passivating gas is H 2 .
13. The method as claimed in claim 5 , wherein the first and the second passivating gases are different gases which are introduced into the chamber simultaneously.