Mask for light exposure
View Patent ↗Light exposure areas 103 and light masking areas 104 in a sole reticle are arrayed in alternation to one another in both the longitudinal and transverse directions. Substrate is exposed to light by multi-domain light exposure using this reticle so that the respective areas of the reticle exposed to light with respective shots A to B, B to C . . . , N to M are not adjacent to one another in the boundary portions of the reticle shifted for executing the respective shots, thus relaxing the difference in illuminance between the respective shots and the difference in finish of the boundary portions of the shots, such differences becoming imperceptible to human eyes upon displaying liquid crystal display apparatus.
1. A mask for light exposure comprising light masking areas and light transmitting areas, wherein a plurality of first blocks having a preset pattern of light exposure and a plurality of second blocks as a pattern for masking are formed in a same shape,
said first blocks and said second blocks being arrayed in alternation with one another in both horizontal and transverse directions,
wherein each of said first blocks has a device pattern corresponding to only one pixel of a display panel.
2. The mask for light exposure as defined in claim 1 wherein said first and second blocks are arrayed at a same pitch of repetition in alternation with one another in both the horizontal and transverse directions, and said display panel comprises liquid display panel.