IP Library Granted Patent US 7,732,786
Granted Patent B2
US 7,732,786 · App. 11/418,078 · Granted Jun 8, 2010

Coupling energy in a plasmon wave to an electron beam

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Quick Facts
Patent No.
US 7,732,786
App. No.
11/418,078
Granted
Jun 8, 2010
Kind
B2
Abstract

A device for coupling energy in a plasmon wave to an electron beam includes a metal transmission line having a pointed end; a generator mechanism constructed and adapted to generate a beam of charged particles; and a detector microcircuit disposed adjacent to the generator mechanism. The generator mechanism and the detector microcircuit are disposed adjacent the pointed end of the metal transmission line and wherein a beam of charged particles from the generator mechanism to the detector microcircuit electrically couples the plasmon wave traveling along the metal transmission line to the microcircuit.

Claims (33)

1. A device for coupling energy in a plasmon wave to an electron beam, the device comprising:

a transmission line;

a generator mechanism constructed and adapted to generate a beam of charged particles along a path adjacent to the transmission line; and

a detector microcircuit disposed along said path, at a location after said beam has gone past said line,

wherein the generator mechanism and the detector microcircuit are disposed adjacent transmission line and wherein a beam of charged particles from the generator mechanism to the detector microcircuit electrically couples the plasmon wave traveling along the transmission line to the microcircuit.

2. A device as in claim 1 wherein the generator mechanism is selected from the group comprising:

an ion gun, a thermionic filament, tungsten filament, a cathode, a vacuum triode, a field emission cathode, a planar vacuum triode, an electron-impact ionizer, a laser ionizer, a chemical ionizer, a thermal ionizer, an ion-impact ionizer.

3. A device as in claim 1 wherein the beam of charged particles comprises particles selected from the group comprising:

positive ions, negative ions, electrons, and protons.

4. A device as in claim 1 wherein the detector microcircuit detects the presence of a plasmon wave in the transmission line.

5. A device as in claim 1 wherein the detector microcircuit detects the absence of a plasmon wave in the transmission line.

6. A device as in claim 1 wherein the transmission line is formed from a metal.

7. A device as in claim 6 wherein the metal comprises a metal selected from the group comprising:

gold (Au), silver (Ag), copper (Cu) and aluminum (Al).

8. A device as in claim 1 wherein the transmission line has a pointed end and wherein the generator mechanism and the detector microcircuit are disposed adjacent the pointed end of the transmission line.

9. A device as in claim 1 further comprising:

shielding structure disposed to prevent interference with the beam of charged particles by sources of electromagnetic radiation (EMR) other than EMR from the transmission line.

10. A method comprising:

generating a beam of charged particles adjacent a metal transmission line; and

detecting changes in said beam of charged particles, wherein said changes are indicative of the presence or absence of a plasmon wave in the metal transmission line.

11. A method as in claim 10 wherein the beam of charged particles is generated by a mechanism selected from the group comprising:

an ion gun, a thermionic filament, a cathode, vacuum triode, a planar vacuum triode, an electron-impact ionizer, a laser ionizer, a chemical ionizer, a thermal ionizer, an ion-impact ionizer.

12. A method as in claim 10 wherein the beam of charged particles comprises particles selected from the group comprising:

positive ions, negative ions, electrons, and protons.

13. A method as in claim 12 wherein the step of detecting indicates the presence of a plasmon wave in the metal transmission line.

14. A method as in claim 12 wherein the step of detecting indicates the absence of a plasmon wave in the metal transmission line.

15. A device for coupling energy in a plasmon wave to an electron beam, the device comprising:

a metal transmission line having a pointed end, the metal comprising silver (Ag);

a generator mechanism constructed and adapted to generate a beam of charged particles, wherein the generator mechanism is selected from the group comprising:

an ion gun, a thermionic filament, tungsten filament, a cathode, a vacuum triode, a field emission cathode, a planar vacuum triode, an electron-impact ionizer, a laser ionizer, a chemical ionizer, a thermal ionizer, an ion-impact ionizer;

a detector microcircuit disposed adjacent to the generator mechanism; and

shielding structure disposed to prevent interference with the beam of charged particles by sources of electromagnetic radiation (EMR) other than EMR from the transmission line,

wherein the generator mechanism and the detector microcircuit are disposed adjacent the pointed end of the transmission line and wherein a beam of charged particles from the generator mechanism to the detector microcircuit electrically couples the plasmon wave traveling along the metal transmission line to the microcircuit.

Assignments (6)
CORRECTIVE ASSIGNMENT TO CORRECT THE TO REMOVE PATENT 7,559,836 WHICH WAS ERRONEOUSLY CITED IN LINE 27 OF SCHEDULE I AND NEEDS TO BE REMOVED AS FILED ON 4/10/2012. PREVIOUSLY RECORDED ON REEL 028022 FRAME 0961. ASSIGNOR(S) HEREBY CONFIRMS THE SECURITY AGREEMENT. Recorded Apr 25, 2018
From: ADVANCED PLASMONICS, INC.
To: V.I. FOUNDERS, LLC
Reel/Frame 046011/0827 →
CORRECTIVE ASSIGNMENT TO CORRECT THE ASSIGNMENT PREVIOUSLY RECORDED AT REEL: 028022 FRAME: 0961. ASSIGNOR(S) HEREBY CONFIRMS THE CORRECTIVE ASSIGNMENT TO CORRECT THE #27 IN SCHEDULE I OF ASSIGNMENT SHOULD BE: TRANSMISSION OF DATA BETWEEN MICROCHIPS USING A PARTICLE BEAM, PAT. NO 7569836.. Recorded Dec 21, 2017
From: ADVANCED PLASMONICS, INC.
To: V.I. FOUNDERS, LLC
Reel/Frame 044945/0570 →
NUNC PRO TUNC ASSIGNMENT Recorded Oct 9, 2012
From: APPLIED PLASMONICS, INC.
To: ADVANCED PLASMONICS, INC.
Reel/Frame 029095/0525 →
NUNC PRO TUNC ASSIGNMENT Recorded Oct 3, 2012
From: VIRGIN ISLAND MICROSYSTEMS, INC.
To: APPLIED PLASMONICS, INC.
Reel/Frame 029067/0657 →
SECURITY AGREEMENT Recorded Apr 10, 2012
From: ADVANCED PLASMONICS, INC.
To: V.I. FOUNDERS, LLC
Reel/Frame 028022/0961 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 5, 2006
From: GORRELL, JONATHAN; DAVIDSON, MARK; MAINES, MICHAEL
To: VIRGIN ISLAND MICROSYSTEMS, INC.
Reel/Frame 017872/0964 →