Methods of producing structures for electron beam induced resonance using plating and/or etching
View Patent ↗We describe an ultra-small structure and a method of producing the same. The structures produce visible light of varying frequency, from a single metallic layer. In one example, a row of metallic posts are etched or plated on a substrate according to a particular geometry. When a charged particle beam passed close by the row of posts, the posts and cavities between them cooperate to resonate and produce radiation in the visible spectrum (or even higher). A plurality of such rows of different geometries are formed by either etching or plating from a single metal layer such that the charged particle beam will yield different visible light frequencies (i.e., different colors) using different ones of the rows.
1. A method of patterning a series of ultra-small structures in a continuum on a single surface to emit electromagnetic radiation at an output wavelength when a charged particle beam is directed generally along and proximate the series of structures, the series having a period between the structures less than the wavelength of the emitted electromagnetic radiation, the method comprising:
providing a conductive layer;
depositing a mask layer on said conductive layer;
defining a pattern in said mask layer having said period; and
growing said series of ultra-small structures on said surface in a pulse-electroplating process including applying a series of voltage pulses comprising at least one positive voltage pulse, wherein each said at least one positive voltage pulse is between 1.5 and 12 volts and each said at least one positive voltage pulse is for a period of less than 500 ns.
2. The method of claim 1 wherein said ultra-small structures are comprised of a material selected from the group consisting silver (Ag), copper (Cu), and gold (Au).
3. The method of claim 1 wherein said mask layer is comprised of photoresist.
4. The method of claim 1 wherein said conductive layer is comprised of one from the group consisting of: carbon, metal, semiconducting material, transparent conductor, indium tin oxide (ITO), conductive polymer, ionic conductor, or sodium chloride.
5. The method of claim 1 wherein the series of voltage pulses includes at least one negative voltage pulse.
6. The method of claim 1 further comprising:
after said step of applying, resting for a rest period of at least 1 microsecond, and then repeating said applying step.
7. The method of claim 6 wherein the rest period is between 1 microsecond and 500 ms.