Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition

1. A positive photosensitive composition comprising:

(A) a compound capable of generating a compound represented by formula (II) upon irradiation with actinic rays or radiation:

wherein R 1 and R 3 each independently represents a monovalent organic group, provided that at least either one of R 1 and R 3 has a proton acceptor functional group, R 1 and R 3 may combine to form a ring and the ring formed may have a proton acceptor functional group;

X 1 , X 2 and X 3 each independently represents —CO— or —SO 2 —;

A represents a divalent linking group;

B represents a single bond, an oxygen atom or —N(Rx)—;

Rx represents a hydrogen atom or a monovalent organic group;

when B is —N(Rx)—, R 3 and Rx may combine to form a ring; and

n represents 1, said compound being a sulfonium salt compound of the compound represented by formula (II) or an iodonium salt compound of the compound represented by formula (II),

(B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; and

(C) a resin capable of decomposing under an action of an acid to increase a solubility of the resin (C) in an alkali developer,

wherein the proton acceptor functional group has a partial structure selected from the group consisting of a crown ether structure, an aza-crown ether structure, a tertiary amine structure, a secondary amine structure, a primary amine structure, a pyridine structure, an imidazole structure, a pyrazine structure and an aniline structure.

2. A compound capable of generating a compound represented by formula (II) upon irradiation with actinic rays or radiation:

wherein R 1 and R 3 each independently represents a monovalent organic group, provided that at least either one of R 1 and R 3 has a proton acceptor functional group, R 1 and R 3 may combine to form a ring and the ring formed may have a proton acceptor functional group;

X 1 , X 2 and X 3 each independently represents —CO— or —SO 2 —;

A represents a divalent linking group;

B represents a single bond, an oxygen atom or —N(Rx)—;

Rx represents a hydrogen atom or a monovalent organic group;

when B is —N(Rx)—, R 3 and Rx may combine to form a ring; and

n represents 1, said compound being a sulfonium salt compound of the compound represented by formula (II) or an iodonium salt compound of the compound represented by formula (II),

wherein the proton acceptor functional group has a partial structure selected from the group consisting of a crown ether structure, an aza-crown ether structure, a tertiary amine structure, a secondary amine structure, a primary amine structure, a pyridine structure, an imidazole structure, a pyrazine structure and an aniline structure.

3. A pattern forming method comprising:

forming a photosensitive film from a positive photosensitive composition according to claim 1 ; and

exposing and developing the photosensitive film.

4. The positive photosensitive composition according to claim 1 ,

wherein the compound as the component (B) is a sulfonium salt of fluoro-substituted alkanesulfonic acid, fluorine-substituted benzenesulfonic acid or fluorine-substituted imide acid.

5. The positive photosensitive composition according to claim 1 ,

wherein the resin as the component (C) has a fluorine atom in a main or side chain.

6. The positive photosensitive composition according to claim 5 ,

wherein the resin as the component (C) has a hexafluoroisopropanol group.

7. The positive photosensitive composition according to claim 1 ,

wherein the resin as the component (C) has a hydroxystyrene repeating unit.

8. The positive photosensitive composition according to claim 1 ,

wherein the resin as the component (C) has at least one repeating unit selected from 2-alkyl-2-adamantyl(meth)acrylate and dialkyl(1-adamantyl)methyl(meth)acrylate.

9. The positive photosensitive composition according to claim 1 ,

wherein the resin as the component (C) has a monocyclic or polycyclic alicyclic hydrocarbon group.

10. The positive photosensitive composition according to claim 9 ,

wherein the resin as the component (C) has at least one repeating unit selected from 2-alkyl-2-adamantyl(meth)acrylate and dialkyl(1-adamantyl)methyl(meth)acrylate, at least one repeating unit having a lactone group and at least one repeating unit having a hydroxyl group.

11. The positive photosensitive composition according to claim 10 ,

wherein the resin as the component (C) further has a repeating unit having a carboxyl group.

12. The positive photosensitive composition according to claim 1 ,

wherein the resin as the component (C) has a silicon atom in a main or side chain.

13. The positive photosensitive composition according to claim 1 ,

wherein the resin as the component (C) has a repeating unit having a lactone group.

14. The positive photosensitive composition according to claim 1 , which further comprises (D) a dissolution inhibiting compound capable of decomposing under an action of an acid to increase a solubility of the compound (D) in an alkali developer and having a molecular weight of 3,000 or less.

15. The positive photosensitive composition according to claim 1 , which further comprises:

(B) a resin soluble in an alkali developer; and

(D) a dissolution inhibiting compound capable of decomposing under an action of an acid to increase a solubility of the compound (D) in an alkali developer and having a molecular weight of 3,000 or less.

16. A negative photosensitive composition comprising:

(A) a compound capable of generating a compound represented by formula (II) upon irradiation with actinic rays or radiation:

wherein R 1 and R 3 each independently represents a monovalent or organic group, provided that at least either one of R 1 and R 3 has a proton acceptor functional group, R 1 and R 3 may combine to form a ring and the ring formed may have a proton acceptor functional group;

X 1 , X 2 and X 3 each independently represents —CO— or —SO 2 —;

A represents a divalent linking group;

B represents a single bond, an oxygen atom or —N(Rx)—;

Rx represents a hydrogen atom or a monovalent organic group;

when B is —N(Rx)—, R 3 and Rx may combine to form a ring; and

n represents 1, said compound being a sulfonium salt compound of the compound represented by formula (II) or an iodonium salt compound of the compound represented by formula (II),

(B) a compound capable of generating an acid upon irradiation with actinic rays or radiation;

(F) a resin soluble in an alkali developer; and

(F) an acid crosslinking agent capable of crosslinking with the resin soluble in an alkali developer under an action of an acid

wherein the proton acceptor functional group has a partial structure selected from the group consisting of a crown ether structure, an aza-crown ether structure, a tertiary amine structure, a secondary amine structure, a primary amine structure, a pyridine structure, an imidazole structure, a pyrazine structure and an aniline structure.

17. The positive photosensitive composition according to claim 1 , which further comprises at least one of (G) a basic compound and (H) at least one of a fluorine-containing surfactant and a silicon-containing surfactant.

18. The positive photosensitive composition according to claim 17 ,

wherein the basic compound (G) is a compound having a structure selected from an imidazole structure, a diazabicyclo structure, an onium hydroxide structure, an onium carboxylate structure, a trialkylamine structure, an aniline structure and a pyridine structure, an alkylamine derivative having at least one of a hydroxyl group and an ether bond or an aniline derivative having at least one of a hydroxyl group and an ether bond.

19. The positive photosensitive composition according to claim 1 ,

wherein the compound (A) capable of generating a compound represented by formula (II) upon irradiation with actinic rays or radiation is a compound represented by the following formula (A1) or (A2):

wherein R 201 , R 202 and R 203 each independently represents an organic group, provided that two members out of R 201 to R 203 may combine to form a ring structure, and the ring may contain an oxygen atom, a sulfur atom, an ester bond, an amide bond or a carbonyl group;

X − represents an anion of the compound represented by formula (II); and

R 204 and R 205 each independently represents an aryl group, an alkyl group or a cycloalkyl group.

20. The compound according to claim 2 ,

wherein the compound capable of generating a compound represented by formula (II) upon irradiation with actinic rays or radiation is a compound represented by the following formula (A1) or (A2):

wherein R 201 , R 202 and R 203 each independently represents an organic group, provided that two members out of R 201 to R 203 may combine to form a ring structure, and the ring may contain an oxygen atom, a sulfur atom, an ester bond, an amide bond or a carbonyl group;

X − represents an anion of the compound represented by formula (II); and

R 204 and R 205 each independently represents an aryl group, an alkyl group or a cycloalkyl group.

21. The compound according to claim 2 , wherein X 1 , X 2 and X 3 each represents —SO 2 —; B represents an oxygen atom or —N(Rx)—; Rx represents a hydrogen atom or a monovalent organic group; when B is —N(Rx)—, R 3 and Rx may combine to form a ring; and n represents 1.

22. The compound according to claim 4 , wherein R 1 and R 3 combine to form a ring and the ring formed has a proton acceptor functional group, and the ring formed includes a structure where the organic groups of R 1 and R 3 are further bonded through an alkylene group, an oxy group or an imino group.

23. The compound according to claim 2 , wherein the divalent linking group as A is a divalent linking group having a carbon number of 1 to 8 and containing a fluorine atom.

24. The compound according to claim 2 , wherein the divalent linking group as A is an alkylene group having a carbon number of 1 to 8 and containing a fluorine atom or a phenylene group having a fluorine atom.

25. The compound according to claim 2 , wherein the divalent linking group as A is an alkylene group having a fluorine atom.

26. The compound according to claim 25 , wherein the alkylene group having a fluorine atom has a carbon number of 2 to 6.

27. The positive photosensitive composition according to claim 1 , wherein X 1 , X 2 and X 3 each represents —SO 2 —; B represents an oxygen atom or —N(Rx)—; Rx represents a hydrogen atom or a monovalent organic group; and when B is —N(Rx)—, R 3 and Rx may combine to form a ring.

28. The positive photosensitive composition according to claim 1 , wherein R 1 and R 2 combine to form a ring and the ring formed has a proton acceptor functional group, and the ring formed includes a structure where the organic groups of R 1 and R 12 are further bonded through an alkylene group, an oxy group or an imino group.

29. The positive photosensitive composition according to claim 1 , wherein the divalent linking group as A is a divalent linking group having a carbon number of 1 to 8 and containing a fluorine atom.

30. The positive photosensitive composition according to claim 1 , wherein the divalent linking group as A is an alkylene group having a carbon number of 1 to 8 and containing a fluorine atom or a phenylene group having a fluorine atom.

31. The positive photosensitive composition according to claim 1 , wherein the divalent linking group as A is an alkylene group having a fluorine atom.

32. The positive photosensitive composition according to claim 31 , wherein the alkylene group having a fluorine atom has a carbon number of 2 to 6.

33. A compound capable of generating a compound represented by formula (II) upon irradiation with actinic rays or radiation:

wherein R 1 and R 3 each independently represents a monovalent organic group, provided that at least either one of R 1 and R 3 has a proton acceptor functional group, R 1 and R 3 may combine to form a ring and the ring formed may have a proton acceptor functional group;

X 1 , X 2 and X 3 each independently represents —CO— or —SO 2 —;

A represents a divalent linking group;

B represents a single bond, an oxygen atom or —N(Rx)—;

Rx represents a hydrogen atom or a monovalent organic group;

when B is —N(Rx)—, R 3 and Rx may combine to form a ring; and

n represents 1, said compound being a sulfonium salt compound of the compound represented by formula (II) or an iodonium salt compound of the compound represented by formula (II),

wherein the proton acceptor functional group has a partial structure selected from the group consisting of a crown ether structure, an aza-crown ether structure, a secondary amine structure, a primary amine structure, a pyridine structure, an imidazole structure, a pyrazine structure and an aniline structure.

34. The positive photosensitive composition according to claim 19 , wherein two members out of R 201 to R 203 combine to form an alkylene group.

35. The positive photosensitive composition according to claim 1 ,

wherein the proton acceptor functional group has a partial structure selected from the group consisting of a crown ether structure, an aza-crown ether structure, a secondary amine structure, a primary amine structure, a pyridine structure, an imidazole structure, a pyrazine structure and an aniline structure.

36. The negative photosensitive composition of claim 16 ,

wherein the proton acceptor functional group has a partial structure selected from the group consisting of a crown ether structure, an aza-crown ether structure, a secondary amine structure, a primary amine structure, a pyridine structure, an imidazole structure, a pyrazine structure and an aniline structure.