Exposure device and method of exposure
View Patent ↗The exposure device includes a polarizing plate and an illumination diaphragm. The polarizing plate is located in an optical path between a light source and a photomask, serving as a polarizing unit that polarizes an illuminating light from the light source in the first and the second direction orthogonal to the optical axis. The illumination diaphragm is a so-called quadruple illumination diaphragm, which includes four openings. The first opening and the second opening are located on a straight line running parallel to a third direction perpendicular to the optical axis and passing the center point of the illumination diaphragm, across the center point from each other. Likewise, the third opening and the fourth opening are located on a straight line running parallel to a fourth direction perpendicular to the optical axis and passing the center point, across the center point from each other.
1. An exposure device comprising:
a polarizing unit in an optical path between a light source and a photomask, so as to polarize an illuminating light from said light source in a first and a second direction perpendicular to an optical axis of said illuminating light; and
an illumination diaphragm in an optical path between said polarizing unit and said photomask,
wherein said illumination diaphragm includes,
first and second openings located on a straight line running parallel to a third direction perpendicular to said optical axis and passing a center point of said illumination diaphragm, across said center point from each other, and
third and fourth openings located on a straight line running parallel to a fourth direction perpendicular to said optical axis and passing said center point, across said center point from each other,
wherein said illuminating light polarized in said first and said second direction by said polarizing unit passes through each of said openings, and
wherein a condition of 0<θ 3 <θ 2 <θ 4 <180° is satisfied, where θ 2 , θ 3 and θ 4 represent an angle at which a straight line parallel to said second, said third and said fourth direction, respectively, crosses with a straight line parallel to said first direction.
2. The exposure device according to claim 1 , wherein said angles θ 2 , θ 3 and θ 4 are set substantially as 90°, 45° and 135°, respectively.
3. An exposure device comprising:
a polarizing unit in an optical path between a light source and a photomask, so as to polarize an illuminating light from said light source in a first and a second direction perpendicular to an optical axis of said illuminating light; and
an illumination diaphragm in an optical path between said polarizing unit and said photomask,
wherein said illumination diaphragm includes,
first and second openings located on a straight line running parallel to a third direction perpendicular to said optical axis and passing a center point of said illumination diaphragm, across said center point from each other, and
third and fourth openings located on a straight line running parallel to a fourth direction perpendicular to said optical axis and passing said center point, across said center point from each other,
wherein said illuminating light polarized in said first and said second direction by said polarizing unit passes through each of said openings,
wherein said illumination diaphragm includes a shielding portion shielding a portion of each of said openings so as to divide each of said openings into a first and a second sub-opening, and
wherein said illuminating light polarized in said first and said second direction passes through said first and said second sub-opening, respectively.
4. The exposure device according to claim 3 ,
wherein said shielding portions of said first and said second opening extend along said third direction; and
said shielding portions of said third and said fourth opening extend along said forth direction.
5. The exposure device according to claim 4 ,
wherein a width w of said shielding portion satisfies 0<w≦0.2, when a distance from said center point to each of said openings is regarded as 1.
6. An exposure device comprising:
a polarizing unit in an optical path between a light source and a photomask, so as to polarize an illuminating light from said light source in a first and a second direction perpendicular to an optical axis of said illuminating light;
an illumination diaphragm in an optical path between said polarizing unit and said photomask, and
a projection optical system provided in an optical path between said photomask and an object of exposure,
wherein said illumination diaphragm includes,
first and second openings located on a straight line running parallel to a third direction perpendicular to said optical axis and passing a centerpoint of said illumination diaphragm, across said center point from each other, and
third and fourth openings located on a straight line running parallel to a fourth direction perpendicular to said optical axis and passing said center point, across said center point from each other,
wherein said illuminating light polarized in said first and said second direction by said polarizing unit passes through each of said openings, and
wherein an equation of d/2≦λ/{2 1/2 ×NA×(1+σ)} is satisfied, where d represents an alignment pitch of a pattern on said photomask, λ a wavelength of said illuminating light, NA a numerical aperture of said projection optical system, and σ a ratio of a distance from said center point to each of said openings to said numerical aperture.