Catalytic enhanced chemical vapor deposition apparatus having efficient filament arrangement structure
View Patent ↗The present invention provides a catalytic enhanced chemical vapor deposition (CVD) apparatus capable of maximizing efficiency of gas use to 80% or more, and obtaining a uniform thin film by efficiently arranging filaments mounted on a shower head of the catalytic enhanced CVD apparatus, thereby uniformly decomposing a deposition source gas. The present invention also provides a method for fabricating an organic electroluminescent device with an inorganic film formed through the catalytic enhanced CVD apparatus.
1. A catalytic enhanced chemical vapor deposition apparatus comprising:
a deposition chamber;
a shower head for storing a deposition source gas, the showerhead including at least two electrodes;
a plurality of gas nozzles formed on the shower head and coupled to the deposition chamber for spraying the deposition source gas into inside of the deposition chamber; and
a filament formed on the shower head and disposed between the plurality of gas nozzles and a substrate on which a deposition is made, the filament being coupled to the electrodes, the filament formed into a pattern, the filament including a plurality of sub-filaments, each of the sub-filaments forming a straight line, the sub-filaments parallel to each other and formed such that a distance between the nearest sub-filaments formed around an edge part of the pattern is narrower than the distance between the nearest sub-filaments formed an central part of the pattern.
2. The catalytic enhanced chemical vapor deposition apparatus according to claim 1 , comprised of the filament made of a material selected from the group consisting of tungsten, tantalum, nickel, and chromium.
3. The catalytic enhanced chemical vapor deposition apparatus according to claim 1 , comprised of the filament having thickness greater than about 0.3 millimeters.
4. The catalytic enhanced chemical vapor deposition apparatus according to claim 3 , comprised of the filament having thickness between about 0.3 millimeters and about 2.0 millimeters.
5. The catalytic enhanced chemical vapor deposition apparatus according to claim 1 , comprised of the deposition source gas being a mixture including silane, ammonia, and nitrogen.
6. The catalytic enhanced chemical vapor deposition apparatus according to claim 1 , comprised of the deposition source gas being a mixture including silane, ammonia, and nitrous oxide.
7. A catalytic enhanced chemical vapor deposition apparatus comprising:
a deposition chamber;
a shower head for storing a deposition source gas, the showerhead including at least two electrodes;
a plurality of gas nozzles formed on the shower head and coupled to the deposition chamber for spraying the deposition source gas into inside of the deposition chamber; and
a filament formed on the shower head and disposed between the plurality of gas nozzles and a substrate on which a deposition is made, the filament being coupled to the electrodes, the filament formed into a pattern, the pattern being asymmetric.
8. The catalytic enhanced chemical vapor deposition apparatus according to claim 7 , comprised of the pattern including a plurality of sub-patterns, each of the sub-patterns being the same.
9. The catalytic enhanced chemical vapor deposition apparatus according to claim 7 , comprised of the filament made of a material selected from the group consisting of tungsten, tantalum, nickel, and chromium.
10. The catalytic enhanced chemical vapor deposition apparatus according to claim 7 , comprised of the filament having thickness greater than about 0.3 millimeters.
11. The catalytic enhanced chemical vapor deposition apparatus according to claim 10 , comprised of the filament having thickness between about 0.3 millimeters and about 2.0 millimeters.
12. The catalytic enhanced chemical vapor deposition apparatus according to claim 7 , comprised of the deposition source gas being a mixture including silane, ammonia, and nitrogen.
13. The catalytic enhanced chemical vapor deposition apparatus according to claim 7 , comprised of the deposition source gas being a mixture including silane, ammonia, and nitrous oxide.
14. A catalytic enhanced chemical vapor deposition apparatus comprising:
a deposition chamber;
a shower head for storing a deposition source gas, the showerhead including at least two electrodes;
a plurality of gas nozzles formed on the shower head and coupled to the deposition chamber for spraying the deposition source gas into inside of the deposition chamber; and
a filament formed on the shower head and disposed between the plurality of gas nozzles and a substrate on which a deposition is made, the filament being coupled to the electrodes, the filament formed into a pattern having a loop shape surrounding the gas nozzles.
15. The catalytic enhanced chemical vapor deposition apparatus according to claim 14 , comprised of the filament made of a material selected from the group consisting of tungsten, tantalum, nickel, and chromium.
16. The catalytic enhanced chemical vapor deposition apparatus according to claim 14 , comprised of the filament having thickness greater than about 0.3 millimeters.
17. The catalytic enhanced chemical vapor deposition apparatus according to claim 16 , comprised of the filament having thickness between about 0.3 millimeters and about 2.0 millimeters.
18. The catalytic enhanced chemical vapor deposition apparatus according to claim 14 , comprised of the deposition source gas being a mixture including silane, ammonia, and nitrogen.
19. The catalytic enhanced chemical vapor deposition apparatus according to claim 14 , comprised of the deposition source gas being a mixture including silane, ammonia, and nitrous oxide.