Laser mode stabilization using an etalon

1 . A system for use with a light source which generates a light beam, comprising:

an etalon comprising a first partially reflective surface and a second partially reflective surface, wherein the etalon receives at least a portion of the light beam and wherein a portion of the received light beam exits the etalon;

a detector which detects an intensity of the portion of the exiting light beam and which provides detected light intensity information; and

a processor which receives the detected intensity information and which adjusts the light source using the detected intensity information.

2 . The system of claim 1 , wherein the detected intensity information includes a first intensity value and second intensity value and wherein the processor calculates a value for the received light beam using the first and second intensity values and wherein the processor uses the calculated value to determine whether to adjust the light source.

3 . The system of claim 2 , wherein the calculated value is a side mode suppression ratio.

4 . The system of claim 2 , wherein the processor determines whether the calculated value is below a threshold value, and if the calculated value is below the threshold value, adjusts the light source.

5 . The system of claim 4 , wherein the processor iteratively adjusts the light source and calculates the value until the calculated value is determined to be below the threshold value.

6 . The system of claim 1 , wherein the first and second partially reflective surfaces are each provided with a partially reflective coating.

7 . The system of claim 6 , wherein the partially reflective coating comprises one or more of: a silver coating, an aluminum coating, or a dielectric coating.

8 . The system of claim 1 , wherein the etalon comprises fused silica.

9 . The system of claim 1 , further comprising a transducer which applies a force to the etalon, and wherein the processor determines the force to be applied by the transducer and directs the transducer to apply the determined force.

10 . The system of claim 9 , wherein the processor adjusts the force applied by the transducer in order to vary an optical path of the etalon over a range of optical paths, and receives detected intensity information for different optical paths.

11 . The system of claim 10 , wherein the processor calculates a value for the received light beam using a first and a second intensity value based on the detected intensity information for the different optical paths.

12 . The system of claim 11 , wherein the processor determines whether the calculated value is below a threshold value, and if the visibility value is determined to be below the threshold, adjusts the light source

13 . The system of claim 1 , wherein the processor adjusts the light source by adjusting a current level for the light source.

14 . The system of claim 1 , wherein the processor adjusts the light source by adjusting one or more of the following: a temperature for the light source, an optical path length for an optical element, or a position for an optical element.

15 . The system of claim 1 , wherein the system which is included in a holographic storage device.

16 . A method for use with a light source which generates a light beam, comprising the following steps of:

(a) detecting an intensity of a portion of a light beam exiting an etalon; and

(b) adjusting the light source using the detected intensity information.

17 . The method of claim 16 , wherein the method comprises the following additional steps:

(c) calculating a value using the detected intensity values;

(d) determining whether the value is above a below a threshold value; and

(e) if the value is below the threshold value, adjusting the light source.

18 . The method of claim 17 , wherein steps (c) through (e) are carried out by iteratively adjusting the light source and calculating the value until it is determined that the calculated value is not below the threshold value.

19 . The method of claim 17 , wherein the calculated value is a side mode suppression ratio.

20 . The method of claim 16 , comprising the following additional steps of:

(f) determining a force to be applied to the etalon; and

(g) applying the determined force to the etalon.

21 . The method of claim 20 , comprising the following additional steps of: (h) adjusting the force applied to the etalon to vary an optical path of the etalon over a range of optical paths; and wherein step (a) is carried out by detecting an intensity of the portion of the light beam exiting the etalon for the different optical paths.

22 . The method of claim 16 , wherein step (b) comprises adjusting a current level of the light source.

23 . The method of claim 16 , wherein step (b) comprises one or more of the following steps: adjusting a temperature for the light source, adjusting an optical path length for an optical element, or adjusting a position for an optical element.

24 . A system for use with a light source which generates a light beam, comprising:

means for detecting an intensity of a portion of a light beam exiting an etalon; and

means for adjusting the light source using the detected intensity information.

25 . The system of claim 24 , further comprising:

means for calculating a value using the detected intensity values;

means for determining whether the value is below a threshold value; and

means for adjusting the light source if the value is below the threshold value.

26 . The system of claim 24 , further comprising:

means for determining a force to be applied to the etalon; and

means for applying the determined force to the etalon.

27 . The system of claim 24 , wherein the means for adjusting comprises means for adjusting a current level of the light source.

28 . The system of claim 24 , wherein the means for adjusting comprises one or more of the following: means for adjusting a temperature for the light source, means for adjusting an optical path length for an optical element, or means for adjusting a position for an optical element.