IP Library Granted Patent US 7,743,488
Granted Patent B2
US 7,743,488 · App. 11/447,293 · Granted Jun 29, 2010

Manufacturing method for variable resistive element

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Quick Facts
Patent No.
US 7,743,488
App. No.
11/447,293
Granted
Jun 29, 2010
Kind
B2
Abstract

In the case where a variable resistive element, which is made of a variable resistor provided between a first and second electrodes, and of which the electrical resistance varies by applying a voltage pulse between the two electrodes, is applied to a resistance nonvolatile memory, there is a range of the resistance value of the variable resistive element in a low resistance state where the nonvolatile memory can operate normally. In the conventional manufacturing method the resistance value of the variable resistive element is too low, therefore, it can not be controlled within a desired range of the resistance value. A step of carrying out of a reduction process is provided at any point after the step of forming a variable resistor material as a film, it has thereby become possible to increase the resistance value of the variable resistive element, which is too low in the conventional method.

Claims (25)

1. A manufacturing method for a variable resistive element comprising a variable resistor comprising a variable resistor material provided between a first electrode comprising a first electrode material and a second electrode comprising a second electrode material, the electrical resistance of the variable resistor being variable between a low resistance value and a high resistance value by applying a voltage pulse between the first electrode and the second electrode, said method comprising:

carrying out a reduction process on the variable resistor so that the electrical resistance of the variable resistor is increased; wherein

carrying out the reduction process comprises carrying out a heat treatment at low temperatures never exceeding 350° C. in a reduction atmosphere including hydrogen, and

carrying out the heat treatment comprises providing a material operating as a hydrogen catalyst, and

the variable resistor comprises an oxide having a perovskite structure which is represented by any one of the following general formulas:

Pr 1-X Ca X [Mn 1-Z M Z ]O 3 , wherein M is any element selected from Ta, Ti, Cu, Cr, Co, Fe, Ni and Ga,

La 1-X AE X MnO 3 , wherein AE is any bivalent alkaline earth metal selected from Ca, Sr, Pb and Ba,

RE 1-X Sr X MnO 3 , wherein RE is any trivalent rare earth element selected from Sm, La, Pr, Nd, Gd and Dy,

La 1-X Co X [Mn 1-Z Co Z ]O 3 ,

Gd 1-X Ca X MnO 3 , and

Nd 1-X Gd X MnO 3 , wherein 0<X<1, 0≦Z<1.

2. The manufacturing method according to claim 1 , wherein a reduction reaction is induced using hydrogen in atom form in carrying out the reduction process on the variable resistor.

3. The manufacturing method according to claim 1 , wherein at least either the first electrode or the second electrode comprises the material operating as a hydrogen catalyst.

4. The manufacturing method according to claim 1 including simultaneously carrying out heat treatment on a first semiconductor substrate having at least the variable resistor and a second semiconductor substrate having a material operating as the hydrogen catalyst on its surface in the reduction atmosphere including hydrogen.

5. The manufacturing method according to claim 1 , wherein the material operating as a hydrogen catalyst includes at least one metal atom selected from Ru, Rh, Pd, Ag, Os, Ir, Pt, Au, Mg, Ni, Cr, W and Ta.

6. The manufacturing method according to claim 1 , wherein the variable resistor comprises an oxide having a perovskite structure which includes at least one element selected from Pr, Ca, La, Sr, Gd, Nd, Bi, Ba, Y, Ce, Pb, Sm and Dy, and at least one type of element selected from Ta, Ti, Cu, Mn, Cr, Co, Fe, Ni and Ga.

7. The manufacturing method according to claim 1 , wherein the second electrode includes at least one material from single precious metals in the platinum group metals, alloys of which the base is a precious metal in the platinum group metals, oxide conductors comprising a metal selected from Ir, Ru, Re and Os, and oxide conductors selected from strontium ruthenium oxide (SRO), lanthanum strontium cobalt oxide (LSCO) and yttrium barium copper oxide (YBCO).

8. The manufacturing method according to claim 1 , wherein the first electrode includes at least one material from precious metals in the platinum group metals, single metals selected from Ag, Al, Cu, Ni, Ti and Ta or alloys of these, oxide conductors comprising a metal selected from Ir, Ru, Re and Os, and oxide conductors selected from strontium ruthenium oxide (SRO), lanthanum strontium cobalt oxide (LSCO) and yttrium barium copper oxide (YBCO).

9. The manufacturing method according to claim 1 including controlling a resistance value at low resistance state of the electrical resistance between the first electrode and the second electrode by adjusting at least one of temperature, hydrogen concentration, and processing time in the heat treatment carried out in the reduction atmosphere including hydrogen.

10. The manufacturing method according to claim 1 , wherein the heat treatment is carried out for about 1 min.

11. The manufacturing method according to claim 1 , wherein the method includes:

(1) forming a film from said second electrode material, (2) forming a film from said variable resistor material, and (3) forming a film from said first electrode material, in the order of (1), (2) and (3);

etching the film formed from the first electrode material to form the first electrode, etching the film formed from the variable resistor material to form the variable resistor; and then

carrying out the reduction process; and

etching the film formed from the second electrode material to form the second electrode.

Assignments (5)
CORRECTION TO THE RECORDATION COVER SHEET OF THE CONFIRMATORY ASSIGNMENT RECORDED ON REEL 029169 FRAME 0870 ON 10/22/2012 TO CORRECT THE SPELLING OF CONVEYING PARTY TAKYUA OTABE TO TAKUYA OTABE AS LISTED ON THE ORIGINAL ASSIGNMENT. Recorded Feb 13, 2013
From: OTABE, TAKUYA; TAMAI, YUKIO
To: SHARP KABUSHIKI KAISHA
Reel/Frame 029809/0755 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 15, 2013
From: INTELLECTUAL PROPERTIES I KFT.
To: XENOGENIC DEVELOPMENT LIMITED LIABILITY COMPANY
Reel/Frame 029632/0534 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 7, 2013
From: SHARP KABUSHIKI KAISHA
To: INTELLECTUAL PROPERTIES I KFT.
Reel/Frame 029574/0933 →
CONFIRMATORY ASSIGNMENT Recorded Oct 22, 2012
From: TAMAI, YUKIO; OTABE, TAKYUA
To: SHARP KABUSHIKI KAISHA
Reel/Frame 029169/0870 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 11, 2006
From: TAMAI, YUKIO; OTABE, TAKUYA
To: SHARP KABUSHIKI KAISHA
Reel/Frame 018179/0808 →