Power semiconductor device
View Patent ↗A power semiconductor device that includes a plurality of gate structure each having a gate insulation of a first thickness, and a termination region, the termination including a field insulation body surrounding the active region and having a recess that includes a bottom insulation thicker than the first thickness.
1. A power semiconductor device comprising:
an active region, said active region including a plurality of gate structures each having a gate insulation of a first thickness;
a termination region, said termination including a field insulation body surrounding said active region, said field insulation body having a recess formed therein said recess having a bottom insulation of a second thickness that is thicker than said first thickness;
a conductive body formed in said field insulation body having a recess formed therein having a on said bottom insulation;
a field plate structure adjacent said field insulation body and disposed between said active region and said recess, said field plate structure including a field plate insulation body thicker than said first thickness, and a conductive field plate body disposed over said field plate insulation body; and
a PN junction region extends from under said recess having said bottom insulation, below said field plate structure and into said active region.
2. A power semiconductor device according to claim 1 , wherein said active region includes at least one source region and a source electrode ohmically connected to said source region.
3. A power semiconductor device according to claim 1 , wherein said first thickness is less than 1000 angstroms and said second thickness is less than 3000 angstroms.
4. A power semiconductor device according to claim 1 , wherein said first thickness is less than 1000 angstroms and said field plate insulation body is less than 3000 angstroms.
5. A power semiconductor device according to claim 1 , wherein said field insulation body is a field oxide having a first density and said bottom insulation is comprised of a grown oxide having a second density, said field oxide being less dense than said grown oxide.
6. A power semiconductor device according to claim 1 , wherein said PN junction region includes a region of one conductivity formed in a region of another conductivity, said region of one conductivity being disposed directly under said bottom insulation, wherein said bottom insulation includes conductive impurities of said one conductivity.
7. A power semiconductor device according to claim 1 , wherein said PN junction region includes a region of one conductivity formed in a region of another conductivity, said region of one conductivity being disposed directly under said field plate insulation body, wherein said field plate insulation body includes conductive impurities of said one conductivity.
8. A power semiconductor device according to claim 1 , further comprising a metallic body in ohmic contact with said conductive body in said recess.
9. A power semiconductor device according to claim 1 , wherein said conductive body in said recess and said conductive field plate body are comprised of conductive polysilicon.