Method for manufacturing a perpendicular magnetic recording transducers
View Patent ↗A method for manufacturing a perpendicular magnetic recording transducer is described. A metallic underlayer, an insulator on the metallic underlayer, and a metal mask on the insulator are provided. The metal mask has an aperture therein. A trench is formed in the insulator. The trench's bottom is narrower than its top and includes part of the metallic underlayer. The top has a width of not more than 0.28 micron. A nonmagnetic seed layer that substantially covers at least the trench bottom and sides and that has a thickness of at least five hundred Angstroms is provided. A perpendicular magnetic pole material is plated on at least part of the seed layer. A CMP is performed, removing part of the perpendicular magnetic pole material. A remaining portion of the perpendicular magnetic pole material forms a perpendicular magnetic recording pole. The nonmagnetic seed layer is a stop layer for the CMP.
1. A method for manufacturing a perpendicular magnetic recording transducer comprising:
providing a metallic underlayer, the metallic underlayer being conductive;
providing an insulator on the metallic underlayer;
providing a metal mask on the insulator, the metal mask having an aperture therein;
forming a trench in the insulator in a location corresponding to the aperture, the trench having a top, a bottom narrower than the top, and sides, the bottom of the trench including a portion of the metallic underlayer, the portion of the metallic underlayer being adjacent to an air-bearing surface, the top of the trench having a width of not more than 0.28 micron;
providing a nonmagnetic seed layer, the nonmagnetic seed layer substantially covering at least the bottom and sides of the trench, the nonmagnetic seed layer having a thickness of at least five hundred Angstroms;
plating a perpendicular magnetic pole material on at least a portion of the seed layer; and
performing a chemical mechanical polish (CMP) to remove a portion of the perpendicular magnetic pole material, a remaining portion of the perpendicular magnetic pole material forming a perpendicular magnetic recording pole, the nonmagnetic seed layer being a stop layer for the CMP.
2. The method of claim 1 wherein the nonmagnetic seed layer has a thickness of at least three hundred Angstroms and not more than seven hundred Angstroms.
3. The method of claim 1 wherein the nonmagnetic seed layer has a thickness of at least four hundred Angstroms and not more than six hundred Angstroms.
4. The method of claim 1 wherein the nonmagnetic seed layer includes at least one of Ru and Ta.
5. The method of claim 1 wherein the nonmagnetic seed layer includes at least one of NiNb, NiCr, Ti, Cr, and Au.
6. The method of claim 1 wherein the metal mask includes at least one of Ru, Ta and NiCr.
7. The method of claim 1 wherein the step of providing the metal mask further includes:
depositing a metal mask layer;
providing a photoresist mask having a pattern on the metal mask layer; and
transferring the pattern of the photoresist mask to the metal mask layer.
8. A method for manufacturing a perpendicular magnetic recording transducer comprising:
providing a metallic underlayer, the metallic underlayer being conductive;
providing an insulator on the metallic underlayer;
providing a metal mask on the insulator, the metal mask having an aperture therein;
forming a trench in the insulator in a location corresponding to the aperture, the trench having a top, a bottom narrower than the top, and sides, the bottom of the trench including a portion of the metallic underlayer, the portion of the metallic underlayer being adjacent to an air-bearing surface and conductive;
providing a nonmagnetic seed layer, the nonmagnetic seed layer substantially covering at least the bottom and sides of the trench;
plating a perpendicular magnetic pole material on at least a portion of the seed layer; and
performing a chemical mechanical polish (CMP) to remove a portion of the perpendicular magnetic pole material, a remaining portion of the perpendicular magnetic pole material forming a perpendicular magnetic recording pole, the nonmagnetic seed layer being a stop layer for the CMP.
9. The method of claim 1 wherein the metallic underlayer is composed of at least one of Cr, NiCr, NiNb, Ru, and Ta.
10. The method of claim 8 wherein the metallic underlayer is composed of at least one of Cr, NiCr, NiNb, Ru, and Ta.
11. The method of claim 8 wherein the step of providing the metal mask further includes:
depositing a metal mask layer;
providing a photoresist mask having a pattern on the metal mask layer; and
transferring the pattern of the photoresist mask to the metal mask layer.