Method for manufacturing a micromechanical motion sensor, and a micromechanical motion sensor
View Patent ↗The present invention relates to measuring devices used in measuring physical quantities, such as acceleration, angular acceleration, or angular velocity, and, more precisely, to micromechanical motion sensors. The area, in the wafer plane, of a motion sensor component according to the present invention is smaller than the area of the motion sensor component having been dice cut and turned by 90°. Correspondingly, the height of the motion sensor component according to the present invention, the component having been turned by 90°, is smaller, in the direction of the joint, than the thickness of the wafer stack formed by the joined wafers. The object of the invention is to provide an improved method of manufacturing a micromechanical motion sensor, and to provide a micromechanical motion sensor suitable, in particular, for use in small micromechanical motion sensor solutions.
1. A method, comprising:
dicing a micromechanical motion sensor component out of a wafer stack obtained by joining at least two wafers to each other,
wherein the micromechanical motion sensor component is diced such, that
in a wafer surface plane, an area of the micromechanical motion sensor component is smaller than an area of the motion sensor component having been dice cut and turned by 90°, and that
in a direction of a joint, a height of the motion sensor component having been turned by 90° is smaller than a thickness of the wafer stack formed by the joining of the at least two wafers;
etching micromechanical motion sensor structures on one wafer;
joining the at least two wafers together to form the wafer stack;
dicing, in the wafer plane, the wafer stack into narrow and long motion sensor components;
turning the motion sensor components by 90 degrees onto one side; and
metallizing connection areas onto a dice cut side of the motion sensor components.
2. The method according to claim 1 , further comprising:
depositing electrical connection areas on a largest dice cut surface of the micromechanical motion sensor.
3. The method according to claim 1 , further comprising:
glazing or oxidizing at least one of the wafers prior to the joining of the wafers.
4. The method according to claim 1 , wherein there three wafers are joined, one sealing wafer on both sides of the wafer comprising the micromechanical motion sensor structures.
5. A micromechanical motion sensor, comprising:
a motion sensor component in a wafer surface plane, the motion sensor component having an area that is smaller than an area of the motion sensor component dice cut and turned by 90°, and a height, in the direction of a joint and turned by 90°, that is smaller than a thickness of a wafer stack formed by joining at least two wafers, wherein seismic masses of the motion sensor are structures installed in a plane in various lateral directions supported at one end at both edges.
6. The motion sensor according to claim 5 , further comprising:
electrical connection areas located on a largest dice cut surface.
7. The motion sensor according to claim 5 , wherein at least one of the seismic masses of the motion sensor is a long, beam-like structure supported at one side wall on both sides.
8. The motion sensor according to claim 5 , wherein at least one of the seismic masses of the motion sensor is a long, beam-like structure supported at a center at both side walls.
9. The motion sensor according to claim 5 , wherein the seismic masses of the motion sensor are structures installed in the plane in various lateral directions supported by thin or narrow torsion springs at one end at both edges.
10. A micromechanical motion sensor, comprising:
a motion sensor component in a wafer surface plane, the motion sensor component having an area that is smaller than an area of the motion sensor component dice cut and turned by 90°, and a height, in the direction of a joint and turned by 90°, that is smaller than a thickness of a wafer stack formed by joining at least two wafers, wherein seismic masses of the motion sensor are triangular structures installed in a plane in various oblique directions supported at one corner at both edges.
11. The motion sensor according to claim 10 , wherein the seismic masses of the motion sensor are triangular structures installed in the plane in various oblique directions supported by thin or narrow torsion springs at one corner at both edges.
12. The motion sensor according to claim 10 , further comprising:
electrical connection areas located on a largest dice cut surface.