Method of forming a protective film and a magnetic recording medium having a protective film formed by the method
View Patent ↗A method of forming a protective film that restrains gas adsorption while preserving durability and corrosion resistance of a plasma CVD carbon film is disclosed. A protective film of a slide-resistant member is deposited by means of a plasma CVD method using a raw material of hydrocarbon gas, wherein a bias voltage higher than −500 V is applied to the slide-resistant member in an initial stage of depositing the protective film, and a bias voltage of −500 V or lower is applied in a final stage of deposition. A proportion of time duration of the final stage is preferably at most 25% of the total time for depositing the protective film. A magnetic recording medium comprising a magnetic recording layer and a protective film formed by the method also is disclosed.
1. A method of forming a protective film on a magnetic recording medium by means of plasma CVD process using a raw material of hydrocarbon gas, wherein a bias voltage higher than −500 V is applied to the magnetic recording medium in an initial stage of depositing the protective film, and a bias voltage of −500 V or lower is applied in a final stage of deposition.
2. The method of forming a protective film according to claim 1 , wherein a proportion of time duration of the final stage of forming the protective film is at most 25% of a total time of the process of forming the protective film.
3. The method of forming a protective film according to claim 1 , wherein the bias voltage at the initial stage of deposition floats at a potential or −100 V or higher.