Apparatus and method for cleaning nozzle
View Patent ↗Disclosed are an apparatus and a method for cleaning a nozzle, which can automatically clean pollutant of the nozzle. The nozzle cleaning apparatus comprises the nozzle in a polluted state, a nozzle cleaning unit to clean a pollutant material from the nozzle by use of an absorbing member, and an absorbing member cleaning unit to clean a pollutant material from the absorbing member. With this configuration, the nozzle cleaning apparatus can clean the polluted nozzle by use of the absorbing member and in turn, can clean the polluted absorbing member by use of cleaning liquid, whereby automatic cleaning of the nozzle can be accomplished. Automatic cleaning of the polluted nozzle has the effect of reducing cleaning labor and time, and improving productivity.
1. A method for cleaning a nozzle, comprising:
transferring a nozzle, which is in a polluted state, to a cleaning position;
cleaning a pollutant material from the nozzle by using an absorbing member; and
cleaning the absorbing member, which is polluted while cleaning the pollutant material from the nozzle;
wherein the cleaning of the pollutant material from the nozzle includes sensing the cleaning position of the nozzle,
transferring the absorbing member to the cleaning position using a first driving unit, a lift to cooperate with the first driving unit, a second driving unit mounted on the lift, and a driving shaft to cooperate with the second driving unit so as to move the absorbing member, and
cleaning the pollutant material from the nozzle by moving the absorbing member both vertically and horizontally using the first and second driving unit.
2. The method as set forth in claim 1 , wherein the absorbing member is made of sponge.
3. The method as set forth in claim 1 , wherein the cleaning of the absorbing member includes:
moving the absorbing member, which is polluted while cleaning the pollutant material from the polluted nozzle, to a compression block;
injecting a cleaning liquid to the absorbing member when the absorbing member comes into contact with the compression block; and
cleaning the absorbing member while compressing the absorbing member by the compression block.
4. The method as set forth in claim 3 , wherein the cleaning liquid is a volatile material.
5. The method as set forth in claim 1 , wherein the pollutant material from the nozzle is any one of a material for forming black matrices or column spacers, liquid crystals, sealant, and photoresist.