Method of manufacturing a diagnostic test strip
View Patent ↗A method for manufacturing a biosensor is provided. The method may include positioning a shadow mask containing a pattern of a plurality of feature sets over a substantially planar base layer containing a plurality of registration points. The method may also include forming at least one of the plurality of feature sets on the substantially planar base layer by selectively depositing a layer of a conductive material on the substantially planar base layer by passing the conductive material through the pattern of the shadow mask and removing the shadow mask from the substantially planar base layer. Alternatively, the method may include providing a laminate structure including a substantially planar base layer containing a plurality of registration points and a photoresist layer containing a pattern of a plurality of feature sets. The method may further include forming at least one of the plurality of feature sets on the substantially planar base layer by selectively depositing a layer of a conductive material on the substantially planar base layer by passing the conductive material through the pattern of the photoresist layer and removing the photoresist layer from the substantially planar base layer.
1. A method for manufacturing a biosensor, comprising: providing a laminate structure including a substantially planar base layer containing a plurality of registration points and a photoresist layer containing a pattern of a plurality of feature sets; forming at least one of the plurality of feature sets on the substantially planar base layer by selectively depositing a layer of a conductive material on the substantially planar base layer by passing the conductive material through the pattern of the photoresist layer; and removing the photoresist layer from the substantially planar base layer.
2. The method of claim 1 , wherein the photoresist layer includes at least one of Shipley's 1705, Shipley's 1713, Shipley's 1717, Shipley's 1045, Shipley's 1075, AZ's 9260, and Futurex.
3. The method of claim 1 , wherein at least one of the plurality of feature sets includes at least one of a working electrode, a counter electrode, a fill-detect electrode, an auto-on conductor, and a coding region.
4. The method of claim 1 , wherein the plurality of registration points are formed by at least one of laser ablation, etching, drilling, printing, punching, scoring, heating, compression and molding.
5. The method of claim 1 , wherein the plurality of feature sets formed on the substantially planar base layer are separated by less than 10 mm.
6. The method of claim 1 , wherein the plurality of registration points are separated by less than 500 mm.
7. The method of claim 1 , wherein the plurality of feature sets formed on the substantially planar base layer are formed at a density greater than one per 400 mm 2 .
8. The method of claim 1 , wherein the plurality of feature sets formed on the substantially planar base layer are formed at a density greater than a density of the plurality of registration points on the substantially planar base layer.
9. The method of claim 1 , wherein at least one of the plurality of feature sets is less than 40 mm in length.
10. The method of claim 1 , wherein at least one of the plurality of registration points is less than 10 mm wide.
11. The method of claim 1 , wherein removing the photoresist layer includes the use of a solvent.
12. The method of claim 11 , wherein the solvent is at least one of a Shipley brand stripper, acetone, trichloroethylene, methyl ethyl ketone, and methyl isobutyl ketone.
13. The method of claim 1 , wherein depositing the layer of the conductive material includes at least one of physical vapor deposition, electroplating, ultrasonic spraying and pressure spraying.
14. The method of claim 13 , wherein physical vapor deposition includes at lest one of sputtering and evaporation.
15. The method of claim 1 , wherein the conductive material includes at least one material selected from the group consisting of gold, platinum, silver, iridium, carbon, indium tin oxide, indium zinc oxide, copper, aluminum, gallium, iron, mercury amalgams, tantalum, titanium, zirconium, nickel, osmium, rhenium, rhodium, palladium, an organometallic, and a metallic alloy.
16. The method of claim 1 , wherein the method further includes depositing a bonding layer on the substantially planar base layer before depositing the conductive material on the substantially planar base layer.
17. The method of claim 16 , wherein the bonding layer includes at least one of titanium and chromium.
18. The method of claim 1 , wherein the method further includes depositing a reagent layer to contact a portion of the plurality of feature sets.
19. The method of claim 18 , wherein the reagent layer further includes at least one of glucose oxidase, glucose dehydrogenase, potassium ferricyanide, and ruthenium hexamine.