Printing substrate for liquid crystal display, and manufacturing method thereof
View Patent ↗The present invention relates to the implementation of minute patterns and thus improving pattern resolution and transcription property. Provided is a printing substrate for a liquid crystal display comprising a transparent insulating substrate, and a material layer for dry etching formed on an upper surface of the transparent insulating substrate, the material layer for dry etching constituting a printing pattern, and a manufacturing method of a printing substrate for a liquid crystal display comprising forming a material layer on a transparent insulating substrate, applying a photo resist along a printing pattern on the upper side of the material layer, dry-etching the material layer along the printing pattern using the photo resist as an etching mask, and striping the photo resist.
1. A manufacturing method of a printing substrate for a liquid crystal display comprising:
depositing a material layer on an upper surface of a transparent insulating substrate, wherein the material layer is formed of at least one of a-Si, SiNx, and SiOx;
depositing a support layer of the same material and the same thickness as the material layer directly on a lower surface of the transparent insulating substrate in order to configure the transparent insulating substrate having the same material of the same thickness on both surfaces so as to reduce a bending of the transparent insulating substrate during a printing process;
applying a photo resist directly on the upper side of the material layer, without an intervening metal layer;
dry-etching the material layer to form a printing pattern using the photo resist as an etching mask;
stripping the photo resist; and
forming a transcription layer of a metal or metal oxide on the dry-etched material layer,
wherein the printing pattern is more than about 4 μm and less than about 10 μm in width.
2. The manufacturing method of the printing substrate for the liquid crystal display of claim 1 , wherein the printing pattern is more than about 20 μm and less than about 30 μm in depth.