Method of manufacturing printing plate and method of manufacturing liquid crystal display device using the same
View Patent ↗A method of manufacturing a precise printing plate, and a method of manufacturing an LCD device using the same are disclosed, the method of manufacturing the precise printing plate comprising forming a mask layer of a predetermined pattern on a substrate; etching the substrate with an etchant including an anionic surfactant by using the mask layer of the predetermined pattern, to thereby form a trench; and removing the mask layer.
1. A method for manufacturing a printing plate comprising:
forming a mask layer having at least one opening on a substrate;
etching the substrate with an etchant including an anionic surfactant using the mask layer as an etch mask, to thereby form at least one trench, wherein the anionic surfactant is adhered to a surface of the mask layer so that the anionic surfactant prevents the at least one trench from being etched horizontally; and
removing the mask layer,
wherein the step of forming a mask layer comprises: sequentially forming a metal layer and a photoresist on the substrate; patterning the photoresist by exposure and development; etching the metal layer using the patterned photoresist as an etch mask, to thereby form the at least one opening; and removing the patterned photoresist.
2. The method of claim 1 , wherein forming a mask layer comprises forming a single-layered or dual-layered structure using chrome Cr, molybdenum Mo, copper Cu, or indium-tin-oxide (ITO).
3. The method of claim 1 , wherein the etchant comprises a fluoric acid (HF) solution including the anionic surfactant.
4. The method of claim 1 , wherein etching the substrate with an etchant comprises etching with a mixture of a fluoric ammonium (NH 4 F) and a fluoric acid (HF) solution including the anionic surfactant.
5. A method for manufacturing a printing plate comprising:
providing a plate substrate and forming a metal mask layer having at least one opening on a plate substrate;
etching the substrate with an etchant including an anionic surfactant using the metal mask layer as an etch mask, to thereby form at least one trench, wherein the anionic surfactant adheres to the metal mask during etching the substrate; and
removing the metal mask layer,
wherein the step of etching the substrate comprises: inducing positive charge in the surface of the metal mask layer, adhering the anionic surfactant onto the surface of the metal mask layer and the anionic surfactant prevents the at least one trench from being etched horizontally.
6. The method of claim 5 , wherein forming a metal mask layer comprises forming layer comprising one or more of chrome, molybdenum, copper, and indium-tin-oxide.
7. The method of claim 5 , wherein the etchant comprises a fluoric acid (HF) solution including the anionic surfactant or a mixture of a fluoric ammonium (NH 4 F) and a fluoric acid (HF) solution including the anionic surfactant.
8. The method of claim 5 , wherein etching the substrate comprises forming a trench in the substrate, wherein the anionic surfactant prevents substantial lateral etching of the plate substrate.