Liquid crystal display device of horizontal electric field type and fabricating method thereof

1. A liquid crystal display device of horizontal electric field type, comprises:

a plurality of gate lines;

a plurality of data lines;

a first short preventive hole is only arranged between a (n−1)th gate line and a (n)th gate line of the plurality of gate lines, and

wherein two pixels are arranged between the (n)th gate line and a (n+1)th gate line of the plurality of gate lines,

wherein each of the two pixels is connected a first storage capacitor and a second storage capacitor,

wherein the first storage capacitor is provided at an overlapping area between a common electrode and a pixel electrode, and

wherein the second storage capacitor is provided at an overlapping area between a common line and the pixel electrode.

2. The liquid crystal display device as claimed in claim 1 ;

wherein the plurality of gate lines are provided on a lower substrate;

wherein the data lines cross the gate lines to define a pixel area; and

wherein the data lines and gate lines are insulated from each other.

3. The liquid crystal display device as claimed in claim 2 , wherein the (n−1)th gate line and the (n)th gate line are symmetrical to each other with respect to the first short preventive hole.

4. The liquid crystal display device of horizontal electric field applying type as claimed in claim 2 , wherein the (n)th gate line and the (n+1)th gate line are symmetrical to each other with respect to the two pixels.

5. The liquid crystal display device as claimed in claim 2 ,

wherein the two pixels includes a first pixel and a second pixel, and

wherein the first and second pixel shares the common line.

6. The liquid crystal display device as claimed in claim 2 , further comprising:

a second short preventive hole that is provided between the two pixels and the gate line.

7. The liquid crystal display device as claimed in claim 2 , wherein the (n)th gate line is formed in such a manner to adjoin with the (n−1)th gate line.

8. A method of fabricating a liquid crystal display device, comprising the acts of:

forming a gate pattern that includes a (n−1)th, a (n)th and a (n+1)th gate line on a lower substrate;

forming a gate insulating film that covers the gate pattern;

forming a semiconductor pattern on the gate insulating film, and a source/drain pattern that overlaps on the semiconductor pattern;

forming a protective film that covers the source/drain pattern; and

forming a first short preventive hole between the (n)th gate line and the (n−1)th gate line,

simultaneously forming a pixel electrode between the (n)th gate line and the (n+1)th gate line, and a second short preventive hole between the (n)th gate line and the (n+1)th gate line when the first short preventive hole is formed.

9. The method as claimed in claim 8 , wherein the act of forming the first short preventive hole includes:

forming a contact hole that exposes the drain electrode, and a first hole that passes through the gate insulating film and the protective film between the (n−1)th gate line and the (n)th gate line; and

forming pixel electrodes that are connected to the drain electrode via the contact hole between the (n)th gate line and the (n−1)th gate line, and a first short preventive hole to expose the lower substrate positioned at a lower portion of the first hole.

10. The method as claimed in claim 8 wherein the act of forming the first short preventive hole includes:

forming a contact hole that exposes the drain electrode, and a first hole that passes through the gate insulating film and the protective film between the (n−1)th gate line and the (n)th gate line; and

forming pixel electrodes that are connected to the drain electrode via the contact hole between the (n)th gate line and the (n−1)th gate line, and a first short preventive hole that exposes the lower substrate positioned at a lower portion of the first hole.

11. The method as claimed in claim 10 , wherein the act of forming the second short preventive hole includes:

simultaneously forming a second hole that passes through the gate insulating film and the protective film between the pixel electrode and the gate lines adjacent to the pixel electrode when the contact hole and the first hole are formed; and

simultaneously forming a second short preventive hole to expose the lower substrate positioned at a lower portion of the second hole when the pixel electrodes and the first short preventive hole are formed.