Method of making coated article using rapid heating for reducing emissivity and/or sheet resistance, and corresponding product
View Patent ↗This invention relates to a method of making a coated article for use in insulating glass (IG) window units, vehicle windows, or the like. The coated article typically includes a low-E coated article, including a low-E (low emissivity) coating supported by a glass substrate. In certain example embodiments, rapid heating (not sufficient for tempering or heat bending) of the coated article is utilized in order to reduce the emissivity and/or sheet resistance of the coated article without significantly damaging the infrared (IR) reflecting layer(s) of the coating, thereby activating the coated article. The glass of the coated article does not become too hot during such rapid heating.
1. A method of making a coated article with reduced emissivity and/or sheet resistance, the method comprising:
forming a low-E coating on a glass substrate thereby resulting in a coated article, the low-E coating comprising at least one infrared (IR) reflecting layer sandwiched between at least first and second dielectric layers, wherein an uppermost layer of the low-E coating is a layer comprising silicon nitride layer; and
rapidly heating the coated article comprising the low-E coating and glass substrate, said rapid heating being performed within 20-30 seconds so that (a) the emissivity and/or sheet resistance of the low-E coating decreases by at least about 3% due to the rapid heating, (b) optical properties of the low-E coating are substantially maintained during the rapid heating, and wherein the glass substrate does not exceed a temperature of about 150 degrees C. during the rapid heating;
wherein the layer comprising silicon nitride which is the uppermost layer of the low-E coating is the layer of the coating closest to a source of said heating.
2. The method of claim 1 , wherein the glass substrate does not exceed a temperature of about 100 degrees C. during the rapid heating.
3. The method of claim 1 , wherein the glass substrate does not exceed a temperature of about 60 degrees C. during the rapid heating.
4. The method of claim 1 , wherein the rapid heating is performed using at least one gas flame, each said gas flame being located only on a coating side of the coated article.
5. The method of claim 1 , wherein the rapid heating causes the emissivity and/or sheet resistance of the low-E coating to decrease by at least about 5%.
6. The method of claim 1 , wherein the rapid heating causes the emissivity and/or sheet resistance of the low-E coating to decrease by at least about 7%.
7. The method of claim 1 , wherein the coated article has a visible transmission of at least about 70%.
8. The method of claim 1 , wherein the IR reflecting layer comprises silver.
9. The method of claim 1 , wherein the low-E coating has an emissivity (E n ) of no greater than about 0.10 and a sheet resistance (R s ) of no greater than about 8 ohms/square.
10. The method of claim 1 , wherein the heating does not cause the glass substrate to reach a temperature sufficient for thermal tempering or heat bending.
11. The method of claim 1 , wherein the glass substrate is not thermally tempered following the recited steps.
12. The method of claim 1 , wherein color characteristics, including a* and b* reflective color values, are maintained substantially the same before and after said rapid heating.
13. The method of claim 1 , wherein the rapid heating is performed so that the emissivity and/or sheet resistance of the low-E coating decreases by at least about 10% due to the rapid heating.
14. The method of claim 1 , wherein the rapid heating is performed so that the emissivity and/or sheet resistance of the low-E coating decreases by at least about 15% due to the rapid heating.
15. A method of making a coated article with reduced emissivity and/or sheet resistance, the method comprising:
forming a low-E coating on a glass substrate thereby resulting in a coated article, the low-E coating comprising at least one infrared (IR) reflecting layer sandwiched between at least first and second dielectric layers, wherein an uppermost layer of the low-E coating is a silicon nitride layer that is 150-350 angstroms thick; and
heating the coated article comprising the low-E coating and glass substrate, said rapid heating being performed for 10-50 seconds so that (a) the emissivity and/or sheet resistance of the low-E coating decreases by at least about 3% due to the heating, (b) the glass substrate does not exceed a temperature of about 150 degrees C. during the heating, while also causing the IR reflecting layer to undergo at least some re-crystallization and/or crystal perfection during the heating, and
wherein the silicon nitride layer which is the uppermost layer of the low-E coating is the layer of the coating closest to a source of said heating.
16. The method of claim 15 , wherein said heating of the coated article is performed so that the emissivity and/or sheet resistance of the low-E coating decreases by at least about 5% due to the heating.
17. The method of claim 15 , wherein said heating of the coated article is performed so that the emissivity and/or sheet resistance of the low-E coating decreases by at least about 10% due to the heating.
18. The method of claim 15 , wherein said heating of the coated article is performed so that the emissivity and/or sheet resistance of the low-E coating decreases by at least about 15% due to the heating.